Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Changyoung Jeong"'
Autor:
Haeshin Lee, Yunhan Lee, Mun-Ja Kim, Il-Kwon Oh, Kyueui Lee, Kiwoo Jun, Changyoung Jeong, Young Chang Seo
Publikováno v:
Angewandte Chemie (International ed. in English). 59(10)
Recently, emerging functions utilizing phenolic molecules, such as surface functionalizing agents or bioadhesives, have attracted significant interest. However, the most important role of phenolic compounds is to produce carbonized plant matter calle
Autor:
Byunghoon Lee, Maenghyo Cho, Changyoung Jeong, Sung Woo Park, Junghwan Moon, Hyungwoo Lee, Muyoung Kim
Publikováno v:
Advances in Patterning Materials and Processes XXXVI.
Extreme ultraviolet (EUV) lithography is one of the most promising techniques in the semiconductor industry to enhance resolution, line edge roughness (LER) and sensitivity of chemically amplified resist (CAR) pattern. Post exposure bake (PEB) proces
Autor:
Junghwan Moon, Muyoung Kim, Maenghyo Cho, Hee-Bom Kim, Byunghoon Lee, Joonmyung Choi, Changyoung Jeong
Publikováno v:
Extreme Ultraviolet (EUV) Lithography IX.
Semiconductor manufacturing industry has reduced the size of wafer for enhanced productivity and performance, and Extreme Ultraviolet (EUV) light source is considered as a promising solution for downsizing. A series of EUV lithography procedures cont
Publikováno v:
International Journal of Automotive Technology. 16:435-445
ESC (Electronic Stability Control) system determines the dynamic stability of a vehicle with information fed from sensors in the vehicle, suppresses side slip by controlling the torques of the brakes and engine, and secures stability during cornering
Autor:
Byunghoon Lee, Joonmyung Choi, Junghwan Moon, Changyoung Jeong, Muyoung Kim, Hee-Bom Kim, Maenghyo Cho
Publikováno v:
SPIE Proceedings.
For decades, downsizing has been a key issue for high performance and low cost of semiconductor, and extreme ultraviolet lithography is one of the promising candidates to achieve the goal. As a predominant process in extreme ultraviolet lithography o
Publikováno v:
International Journal of Automotive Technology. 15:961-966
The current test methods are insufficient to evaluate and ensure the safety and reliability of vehicle systems for all possible dynamic situations, including the worst case scenarios such as rollover, spin-out and so on. Although the known NHTSA Sine
Autor:
Hyungwoo Lee, Muyoung Kim, Junghwan Moon, Sungwoo Park, Byunghoon Lee, Changyoung Jeong, Maenghyo Cho
Publikováno v:
Proceedings of SPIE; 1/23/2019, Vol. 10960, p1-6, 6p
Publikováno v:
International Journal of Automotive Technology. 14:965-970
Traffic accidents are caused by various factors, which can be classified into human factors, vehicle factors and environmental factors. Recently, human factors have been drawing particular attention as efforts are being made to enhance the safety per
Publikováno v:
International Journal of Automotive Technology. 14:123-132
Research and development involving intelligent vehicles of today is geared to safe, driver-friendly and sensitive vehicles that provide a driver with a pleasant and convenient driving environment while preventing him or her from possible risks of acc
Autor:
Changyoung Jeong, Hansun Cha, Han-Ku Cho, Jae Uk Lee, Jinho Ahn, Sangsul Lee, Seungyu Rah, Seong-Sue Kim, Donggun Lee, Jonggul Doh
Publikováno v:
Journal of the Korean Physical Society. 57:1486-1489
The impact of carbon contamination on imaging performance was analyzed using an in-situ accelerated contamination system (ICS) combined with coherent scattering microscopy (CSM) at the 11B extreme ultraviolet lithography (EUVL) beamline of the Pohang