Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Chang-Ou Lee"'
Publikováno v:
Journal of The Electrochemical Society. 137:196-200
Spin‐on‐glass (SOG) has been characterized using process control techniques that provide in‐line monitoring capability. Film composition changes have been observed for different anneal temperatures (300°–1000°C) and ambients (oxygen and nit
Publikováno v:
Journal of The Electrochemical Society. 135:711-714
Autor:
P. J. Tobin, Chang‐Ou Lee
Publikováno v:
Journal of The Electrochemical Society. 133:2147-2152
The interstitial oxygen concentration, wafer warpage, and flatness were measured after each step of a typical n‐well CMOS process. It is found that a critical oxygen concentration of 30.0 ppm exists below which no appreciable precipitation takes pl
Publikováno v:
Journal of The Electrochemical Society. 135:2111-2113
X-ray fluorescence (XRF) has received a great deal of attention in the last few years as a quantitative means of determining both the stoichiometry and thickness of many different kinds of films. Examples include Ag and Cu films on mica substrates, S
Publikováno v:
Metallurgical Transactions A. 6:1751-1753
A computer algorithm for the rapid solution of Laue back reflection patterns of sapphire crystals is described, (although other hexagonal systems could be indexed with minor changes). Reflections of planes having indices (3, 3, 3) and lower are index
Publikováno v:
Advances in Resist Technology and Processing VI.
Fourier transform infrared (FUR) spectroscopy was used to study the effects of various resist process variables on the photospeed. Resist components which are responsible for photospeed changes were identified. The doublet peak around 2100 cm -1 , wh
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 6:1533
A nondestructive, noncontact, optical method was successfully developed to measure thicknesses of titanium and titanium silicide thin films by observing infrared transmissions. These transmissions can be substantial for film thicknesses of up to 850
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1988, Vol. 6 Issue 5, p1533-1536, 4p
Publikováno v:
Metallurgical transactions. Part A: Physical Metallurgy & Materials Science; 1975, Vol. 6 Issue 9, p1751-1753, 3p
Autor:
Jean-pierre Fillard
This book contains the most recent information on optical nanoscopy. Far-Field and Near-Field properties on e.m. waves are presented which illustrate how optical images can be obtained from sub-micron objects. Scanning Probe techniques and computer p