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pro vyhledávání: '"Chang-Kil Nam"'
Autor:
Chang-Kil Nam, Jang-Hoon Choi, Gi-Chung Kwon, GwangSup Cho, Buil Jeon, Dong-Jin Kim, Myoung-Soo Yun, Tae-Hoon Jo
Publikováno v:
2011 Abstracts IEEE International Conference on Plasma Science.
It has been very interested pulsed bias etching system because of it's low electron temperature and good plasma uniformity. Low electron temperature can enhance etch selectivity and it is very crucial for oxide etching. In the pulse operation system,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::78c1cd71c08bd453c56d9015d34662f0
https://doi.org/10.1109/plasma.2011.5993306
https://doi.org/10.1109/plasma.2011.5993306
Autor:
Tae-Hoon Jo, Myoung-Soo Yun, Bu-Il Jeon, GwangSup Cho, Gi-Chung kwon, Jang-Hoon Choi, Dong-Jin Kim, Chang-Kil Nam
Publikováno v:
2011 Abstracts IEEE International Conference on Plasma Science (ICOPS); 2011, p1-1, 1p