Zobrazeno 1 - 10
of 104
pro vyhledávání: '"Chang Jin Kang"'
Autor:
Chang, Jin-Kang1 (AUTHOR), Schillhammer, Harald2 (AUTHOR), Tang, Liang1 (AUTHOR) staphylinidae@shnu.edu.cn
Publikováno v:
ZooKeys. 2024, Issue 1212, p65-77. 13p.
Akademický článek
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Publikováno v:
Korean Journal of Anesthesiology, Vol 58, Iss 1, Pp 45-49 (2010)
BackgroundThe present study tested the effect of midazolam administration after sevoflurane anesthesia against emergence agitation in children in the recovery phase.MethodsA total of 60 children presenting for ophthalmic surgery under sevoflurane ane
Externí odkaz:
https://doaj.org/article/9078bf71a0db4b31b079459fae3aec84
Publikováno v:
Microelectronic Engineering. 104:33-36
An attenuated phase shift mask (PSM) (half-tone PSM) is an effective and common technique for resolution enhancement and for forming specific patterns. When an ArF-attenuated PSM with hole- or space-type patterns is used under a KrF light source scan
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::18e703a30402a7fcb8b5368f88124e60
https://doi.org/10.1016/j.mee.2012.11.003
https://doi.org/10.1016/j.mee.2012.11.003
Autor:
Dong-Kwon Kim, Chang-Jin Kang, Kyoung-sub Shin, Jeong-Yun Lee, Dong-Hwan Kim, Si-Young Choi, Myeong-cheol Kim
Publikováno v:
Thin Solid Films. 519:6645-6648
The UV-induced damages to the gate oxide in a commercially available high-density-plasma dielectric oxide deposition system for the ultra-large integrated circuit fabrication process were analyzed systematically using the metal-oxide-semiconductor ca
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e484ad924cb4242a8aac89cca5cbab1b
https://doi.org/10.1016/j.tsf.2011.04.134
https://doi.org/10.1016/j.tsf.2011.04.134
Publikováno v:
ECS Transactions. 33:143-147
Three-dimensional stacked memory has attracted much attention due to its advantages such as high-speed operation, low-power consumption, and high-level integration. Many researchers have reported various novel approaches to achieve three dimensional
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::aec433c313be2e7f0c229a927b4cb116
https://doi.org/10.1149/1.3487542
https://doi.org/10.1149/1.3487542
Autor:
Kwang Ryul Kim, Joo Tae Moon, Chang Jin Kang, Kong Soo Lee, Hongsik Jeong, Hyunho Park, Jae Jong Han, Hanwook Jeong, Young Sub Yoo, Byoungdeog Choi, Daehan Yoo, Seok Sik Kim
Publikováno v:
ECS Transactions. 28:281-286
Vertical diodes for cross-point phase change memory were realized by selective epitaxial growth (SEG) technique using cyclic chemical vapor deposition method. H2/SiH4/Cl2 cyclic CVD system was introduced in batch-type vertical furnace equipement, rep
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::85797a4014689c06e6595198abd2049f
https://doi.org/10.1149/1.3375613
https://doi.org/10.1149/1.3375613
Publikováno v:
Korean Journal of Anesthesiology, Vol 58, Iss 1, Pp 45-49 (2010)
Korean Journal of Anesthesiology
Korean Journal of Anesthesiology
Background The present study tested the effect of midazolam administration after sevoflurane anesthesia against emergence agitation in children in the recovery phase. Methods A total of 60 children presenting for ophthalmic surgery under sevoflurane
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0261620e6ad92530499fbeafa0a8b8a4
http://ekja.org/upload/pdf/kjae-58-45.pdf
http://ekja.org/upload/pdf/kjae-58-45.pdf
Autor:
Sang-Wook Kim, Sung-Soo Suh, Yong-Jin Chun, Young-Chang Kim, Suk-Joo Lee, Jung-Hyeon Lee, Sung-Woon Choi, Chang-Jin Kang, Woo-Sung Han, Joo-Tae Moon
Publikováno v:
Japanese Journal of Applied Physics. 47:4893-4897
In this paper, key process factors are computed during OPC for each fragment segments to perform a full-chip analysis of hot spot and removal of hot spot via process factor cost driven auto-correction or provide design guide for design for patterning
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::eb081f33be53883ea30d6c2f7ed114bf
https://doi.org/10.1143/jjap.47.4893
https://doi.org/10.1143/jjap.47.4893
Autor:
Beom Hoan O, Chang-Jin Kang, Chin-Wook Chung, Dae-Kyu Choi, Joung Ho Lee, Suk-Ho Joo, Se-Geun Park, Jong Woo Lee, Junghoon Joo, Sung Kyeong Kim, Seung Gol Lee, Park Soon, Wan Jae Park, Duck Jin Chung, Chung-Gon Yoo, Joohee Kim, Sang-Deog Cho, Hyoun Woo Kim, Woon Suk Hwang, Jeong-Yeol Jang, Keeho Kim, Young-Chang Joo, Sung Pil Chang
Publikováno v:
Microelectronic Engineering. 85:300-303
We have investigated the characteristics of Ar/O"2 plasmas in terms of the photoresist (PR) and low-k material etching using a ferrite-core inductively coupled plasma (ICP) etcher. We found that the O"2/(O"2+Ar) gas flow ratio significantly affected
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fc662b8467894843fae89ff7529da910
https://doi.org/10.1016/j.mee.2007.06.016
https://doi.org/10.1016/j.mee.2007.06.016