Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Chan-Ha Park"'
Autor:
Shinichiro Kawakami, Tomoya Onitsuka, Yuya Kamei, Satoru Shimura, Chan Ha Park, Sangho Lee, Hong Goo Lee, Jae Wook Seo, Jin il Kim, Jun ho Roh, Jin Hyung Kim, Ki Lyoung Lee, Seiji Nagahara, Jeoung Yun Kim, Jang Hwan Kim, Jong Eun Park
Publikováno v:
Advances in Patterning Materials and Processes XXXIX.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5e53c9ecc45278848f1328f61bcbd952
https://doi.org/10.1117/12.2613974
https://doi.org/10.1117/12.2613974
Autor:
Chan-Ha Park, Jeroen Van de Kerkhove, Nouredine Rassoul, Anne-Laure Charley, Pieter Vanelderen, Frederic Lazzarino, Lieve Van Look, Amir-Hossein Tamaddon, Romuald Blanc, Frieda Van Roey, Geert Vandenberghe, Danilo De Simone, Kurt G. Ronse, Chang-Moon Lim, Junghyung Lee, Sarohan Park, Kilyoung Lee, Nadia Vandenbroeck, Roberto Fallica, Gian Lorusso
Publikováno v:
Extreme Ultraviolet (EUV) Lithography X.
Extreme ultraviolet (EUV) materials are deemed as critical to enable and extend the EUV lithography technology. Currently both chemically amplified resist (CAR) and metal-oxide resist (MOR) platforms are candidates to print tight features on wafer, h
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cbc1b20f28b8697fcc5bc1e231e9123f
https://doi.org/10.1117/12.2515170
https://doi.org/10.1117/12.2515170
Autor:
Hong-Goo Lee, Dong-Young Lee, Jun-Yeob Kim, Sang-Jun Han, Chan-Ha Park, Karssenberg, Jaap, Shahrjerdy, Mir, van Leest, Arno, Nang-Lyeom Oh, Dong-Hak Lee, Aileen Soco, Tjitte Nooitgedagt
Publikováno v:
Proceedings of SPIE; 1/22/2019, Vol. 10959, p1-8, 8p
Autor:
De Simone, Danilo, Blanc, Romuald, Van de Kerkhove, Jeroen, Tamaddon, Amir-Hossein, Fallica, Roberto, Van Look, Lieve, Rassoul, Nouredine, Lazzarino, Frederic, Vandenbroeck, Nadia, Vanelderen, Pieter, Lorusso, Gian, Van Roey, Frieda, Charley, Anne-Laure, Vandenberghe, Geert, Ronse, Kurt, Kilyoung Lee, Junghyung Lee, Sarohan Park, Chang-Moon Lim, Chan-Ha Park
Publikováno v:
Proceedings of SPIE; 1/20/2019, Vol. 10957, p109570T-1-109570T-10, 10p
Autor:
Seoud, Ahmed, Juhwan Kim, Yuansheng Ma, Jayaram, Srividya, Le Hong, Gyu-Yeol Chae, Jeong-Woo Lee, Dae-Jin Park, Hyoung-Soon Yune, Se-Young Oh, Chan-Ha Park
Publikováno v:
Proceedings of SPIE; 1/15/2018, Vol. 10587, p1-10, 10p
Autor:
Seoud, Ahmed, Hany, Sherif, Juhwan Kim, Jebum Yoon, Boram Jung, Sang-Jin Oh, Byoung-Sub Nam, Se-Young Oh, Chan-Ha Park
Publikováno v:
Proceedings of SPIE; 1/15/2018, Vol. 10587, p1-6, 6p
Autor:
Chan Ha Park, Tom Cecil, Dave Kim, Sung-Woo Lee, Jinhyuck Jeon, Mindy Lee, Seung-Hee Baek, Kevin Lucas, Jung-Hoe Choi, Guangming Xiao
Publikováno v:
SPIE Proceedings.
Model-driven target optimization using an ILT hotspot fixer is applied to line collapsing defects of 2- dimensional randomtest pattern of a very low K1 process. The target is moved by minimizing the process variation band and the pitches of hotspot p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c7d6193b8820f09e004ebb016915fd54
https://doi.org/10.1117/12.2026140
https://doi.org/10.1117/12.2026140
Autor:
Qiming Jin, Cirelli, Joni A., Chan Ha Park, Sugai, James V., Taba Jr., Maria, Kostenuik, Paul J., Giannobile, William V.
Publikováno v:
Journal of Periodontology; Jul2007, Vol. 78 Issue 7, p1300-1308, 9p, 2 Diagrams, 3 Graphs