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pro vyhledávání: '"Chakravarty, Srinivas L.N."'
Autor:
CHAKRAVARTY, SRINIVAS L.N.
Plasma-enhanced chemical vapor deposition (PECVD) was used to deposit silica-like films onto various substrates to improve their scratch resistance. These films were deposited using a dual-frequency (microwave/low frequency) plasma reactor, which all
Externí odkaz:
http://rave.ohiolink.edu/etdc/view?acc_num=ucin973542599
Autor:
Hughey, Michael P.1 hughey@cems.umn.edu, Morris, Dylan J.1, Cook, Robert F.1, Bozeman, Steven P.2, Kelly, Brian L.2, Chakravarty, Srinivas L.N.2, Harkens, David P.2, Stearns, Laura C.2
Publikováno v:
Engineering Fracture Mechanics. Jan2004, Vol. 71 Issue 2, p245. 17p.
