Zobrazeno 1 - 10 of 25 pro vyhledávání: '"Cesar Garza"'
3
Reconfiguration Distributed Objects in an Intelligent Manufacturing Cell
Autor: Pablo Cesar Garza Alanis, Ismael Lopez Juarez, Reyes Rios Cabrera, Héctor Benítez Pérez, Adrian Duran Chavesti
Publikováno v: IEEE Latin America Transactions. 14:136-146
A manufacture system with the abilities of easy reconfiguration and highly scalability becomes flexible, dynamic and open to the use of software technologies. To give these abilities to a manufacture cell formed of three industrial robots and two con
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::63706aefaef3fd61473d65c9ac1f1661
https://doi.org/10.1109/tla.2016.7430073
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5
Trends in photolithography materials
Autor: Will Conley, Cesar Garza
Publikováno v: Photochemistry ISBN: 9781847550545
New trends on materials for photolithography are presented
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::67a045aa0bd6c192ee1d0a242d2a0c0f
https://doi.org/10.1039/9781849730860-00369
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6
Akademický článek
Telepsychiatric transference-focused psychotherapy for borderline personality disorder: A case report and literature review
Autor: Daniel García-Chapa, César Garza-Guerrero
Publikováno v: Medicina Universitaria, Vol 24, Iss 3 (2022)
Borderline personality disorder (BPD) is characterized by extreme sensitivity to perceived interpersonal conflicts, an unstable sense of self, intense and volatile emotions, impulsive behavior, and recurrent suicidality. This report presents a woman
Externí odkaz: https://doaj.org/article/bc8c534cd90942f4813fd5e514e0d29c
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7
The study of phase-angle and transmission specifications of 6% att-EAPSM for 90nm, 65nm, and 45nm node wafer manufacturing patterning process
Autor: Cesar Garza, Gong Chen
Publikováno v: SPIE Proceedings.
6% attenuated embedded PSM (att-EAPSM) has been widely used in semiconductor wafer manufacturing industry at 130nm, 90nm, 65nm and 45nm nodes. To effectively use the 6% att-EAPSM photomask technology and reduce its manufacturing costs, it is importan
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::70de4a8f04481fdf236a0250635ae3df
https://doi.org/10.1117/12.740717
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9
Early look into device level imaging with beyond water immersion
Autor: David Van Steenwinckel, Cesar Garza, Will Conley, Scott Warrick, Pierre-Jerome Goirand, Jan-Willem Gemmink
Publikováno v: SPIE Proceedings.
The lithography prognosticator of the early 1980's declared the end of optics for sub-0.5mm imaging. However, significant improvements in optics, photoresist and mask technology continued through the mercury lamp lines (436, 405 & 365nm) and into las
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::dc27dbc0af5a2e58ff43bf3a971da4ec
https://doi.org/10.1117/12.714341
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10
Improved ion implantation masking through photoresist fluorination
Autor: Kiwoon Kim, Marijean Azrak, Cesar Garza, Terry A. Breeden, Richard Peters, J. Jiang, Patrick Montgomery
Publikováno v: SPIE Proceedings.
As semiconductor gate lengths shrink, photoresist trends toward thinner films. Thick photoresist films are not desirable because they tend to absorb more light, require higher energies to pattern, increase pattern collapse, and subtract from depth of
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::315c0d39f4bbe098513a4a4075e0e8e6
https://doi.org/10.1117/12.651047
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