Zobrazeno 1 - 10
of 54
pro vyhledávání: '"Celestre, R.S."'
Publikováno v:
In Materials Science & Engineering A 2009 524(1):28-32
Autor:
Caldwell, Wendel A., Kunz, Martin, Celestre, R.S., Domning, E.E., Walter, M.J., Walker, D., Glossinger, J., MacDowell, A.A., Padmore, H.A., Jeanloz, R., Clark, S.M.
Publikováno v:
In Nuclear Inst. and Methods in Physics Research, A 2007 582(1):221-225
Autor:
Phillips, M.A, Spolenak, R, Tamura, N, Brown, W.L, MacDowell, A.A, Celestre, R.S, Padmore, H.A, Batterman, B.W, Arzt, E, Patel, J.R
Publikováno v:
In Microelectronic Engineering 2004 75(1):117-126
Autor:
Choi, W.J., Lee, T.Y., Tu, K.N., Tamura, N., Celestre, R.S., MacDowell, A.A., Bong, Y.Y., Nguyen, Luu
Publikováno v:
In Acta Materialia 2003 51(20):6253-6261
Autor:
MacDowell, A.A. *, Celestre, R.S., Tamura, N., Spolenak, R., Valek, B., Brown, W.L., Bravman, J.C., Padmore, H.A., Batterman, B.W., Patel, J.R.
Publikováno v:
In Nuclear Inst. and Methods in Physics Research, A 2001 467 Part 2:936-943
Autor:
Valek, B.C., Tamura, N., Spolenak, R., Caldwell, W.A., MacDowell, A.A., Celestre, R.S., Padmore, H.A., Bravman, J.C., Batterman, B.W., Nix, W.D., Patel, J.R.
Publikováno v:
Journal of Applied Physics; 9/15/2003, Vol. 94 Issue 6, p3757, 5p, 2 Black and White Photographs, 1 Diagram, 1 Graph
Autor:
Yashchuk, V.V., Cambie, R., Celestre, R.S., Church, M.N., Heimann, P., Glossinger, J.M., Goldberg, K.A., Gullikson, E.M., Kirschman, J.L., MacDowell, A.A., McKinney, W.R., Morrison, G.Y., Padmore, H.A., Voronov, D.L., Warwick, T.
Publikováno v:
Yashchuk, V.V.; Cambie, R.; Celestre, R.S.; Church, M.N.; Heimann, P.; Glossinger, J.M.; et al.(2008). Development of Metrology of X-ray Optics at the ALS. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/4x28h706
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od_______325::1399efbeb0e2e3a1e6eeead00bc4645c
http://www.escholarship.org/uc/item/4x28h706
http://www.escholarship.org/uc/item/4x28h706
Autor:
Tamura, N., MacDowell, A.A., Spolenak, R., Valek, B.C., Bravman, J.C., Brown, W.L., Celestre, R.S., Padmore, H.A., Batterman, B.W., Patel, J.R.
Publikováno v:
Tamura, N.; MacDowell, A.A.; Spolenak, R.; Valek, B.C.; Bravman, J.C.; Brown, W.L.; et al.(2003). Scanning x-ray microdiffraction with submicron white beam for strain and orientation mapping in thin films. Journal of Synchrotron Radiation, 10. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/2jf3k051
Scanning X-ray Microdiffraction (m-SXRD) combines the use of high brilliance synchrotron sources with the latest achromatic X-ray focusing optics and fast large area 2D-detector technology. Using white beams or a combination of white and monochromati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od_______325::48c5770c98ec0ff74cb9c8570a66a44d
http://www.escholarship.org/uc/item/2jf3k051
http://www.escholarship.org/uc/item/2jf3k051
Autor:
Spolenak, R., Barr, D.L., Gross, M.E., Evans-Lutterodt, K., Brown, W.L., Tamura, N., MacDowell, A.A., Celestre, R.S., Padmore, H.A., Valek, B.C., Bravman, J.C., Flinn, P., Marieb, T., Keller, R.R., Batterman, B.W., Patel, J.R.
Publikováno v:
Spolenak, R.; Barr, D.L.; Gross, M.E.; Evans-Lutterodt, K.; Brown, W.L.; Tamura, N.; et al.(2001). Microtexture of Strain in electroplated copper interconnects. Lawrence Berkeley National Laboratory. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/8mf0v79p
The microstructure of narrow metal conductors in the electrical interconnections on IC chips has often been identified as of major importance in the reliability of these devices. The stresses and stress gradients that develop in the conductors as a r
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od_______325::2650731d39bf4d2b1cb20877db514f30
http://www.escholarship.org/uc/item/8mf0v79p
http://www.escholarship.org/uc/item/8mf0v79p
Autor:
Choi, W.J., Lee, T.Y., Tu, K.N., Tamura, N., Celestre, R.S., Macdowell, A.A., Bong, Y.Y., Nguyen, L., Sheng, G.T.T.
Publikováno v:
52nd Electronic Components & Technology Conference 2002. (Cat. No.02CH37345); 2002, p628-633, 6p