Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Cees Lambregts"'
Autor:
Natalia V. Davydova, Lieve van Look, Vincent Wiaux, Joost Bekaert, Frank Timmermans, Eelco van Setten, Bram Slachter, Laura L. Huddleston, Claire van Lare, Rongkuo Zhao, Dezheng Sun, Ming-Chun Tien, Marcel Beckers, Simon van Gorp, Cees Lambregts, Chung-Tien Li, Arthur van de Nes, Koen D'Havé, Tatiana Kovalevich, Diederik de Bruin, Stephen Hsu, Rene Carpaij
Publikováno v:
Optical and EUV Nanolithography XXXVI.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4dab72bbb0e94903157e9929591fe380
https://doi.org/10.1117/12.2658511
https://doi.org/10.1117/12.2658511
Autor:
Won-Kwang Ma, Jigang Ma, Miao Yu, Sangjun Han, Sotirios Tsiachris, Gwang-Gon Kim, Jun-Yeob Kim, Kyong-Seok Kim, Chanha Park, Sang-Jun Park, Cees Lambregts, Paul Böcker, Jung-Hwan Kim
Publikováno v:
Optical Microlithography XXXIII.
In world-leading semiconductor manufacturing, the device feature size keeps on reducing and with it processes become more challenging in the next technology node. The on-product overlay budget is therefore required to reduce further. Alignment is one
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::83663758a2370a0cc724362f80b615a5
https://doi.org/10.1117/12.2552938
https://doi.org/10.1117/12.2552938
Autor:
Seung-Woo Koo, Jung-Il Hwang, Hyun-Sok Kim, Rizvi Rahman, Kwang-Young Hu, Dong-Jin Lee, Min-Shik Kim, Raheleh Pishkari, In-Ho Joo, Dong-Hak Lee, Jae-Wuk Ju, Allwyn Boustheen, Ik-Hyun Jeong, Marc Hauptmann, Paul Böcker, Kang-San Lee, Kang-Min Lee, Cees Lambregts, Young-Sik Kim
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIV.
In advanced DRAM semiconductor manufacturing, there is a need to reduce the overlay fingerprints. Reducing on device fingerprints with very high spatial frequency remains one of the bottlenecks to achieve sub-2nm on device overlay. After-etch device
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a8882fbb7d4f4224fc01c899081e8b10
https://doi.org/10.1117/12.2552028
https://doi.org/10.1117/12.2552028
Autor:
Paul Böcker, Young-Sik Kim, Miao Yu, Ik-Hyun Jeong, Cees Lambregts, Nang-Lyeom Oh, Yeong-Oh Kong, Ji-Hyun Song, Elliott McNamara, Rizvi Rahman, Leendertjan Karssemeijer, Jin-Seo Lee, Hyun-Sok Kim, Jong-Cheol Choi, Kang-San Lee, Jae-Wuk Ju
Publikováno v:
Optical Microlithography XXXII.
To support the manufacturing of DRAM semiconductors for next and future nodes, there is a constant need to reduce the overlay fingerprints. In this paper we evaluate algorithms which are capable of decoupling wafer deformation from mark deformation a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9951bf7cc2ca94b8793eff21f2aeaaf4
https://doi.org/10.1117/12.2516259
https://doi.org/10.1117/12.2516259
Autor:
Minsung Hyun, Cees Lambregts, Nang-Lyeom Oh, Jae-Wuk Ju, Jun-Hyung Lee, Wim Tjibbo Tel, Peter G. van Rhee, Paul Böcker, Elliott McNamara, Hyun-Sok Kim, Johan Kim, Young-Sik Kim
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXII.
Computational metrology has been proposed as the way forward to resolve the need for increased metrology density, resulting from extending correction capabilities, without adding actual metrology budget. By exploiting TWINSCAN based metrology informa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::292f6f3388c9432f9db79ab27b5e77db
https://doi.org/10.1117/12.2297182
https://doi.org/10.1117/12.2297182
Autor:
Linmiao Zhang, Zakir Ullah, Joel Thomas, Wim Tjibbo Tel, Ravin Somasundaram, Klaus Thul, Kaustuve Bhattacharyya, Cees Lambregts, Ronald Goossens, Emil Schmitt-Weaver, Venky Subramony, Chris de Ruiter, Masazumi Matsunobu
Publikováno v:
SPIE Proceedings.
With photolithography as the fundamental patterning step in the modern nanofabrication process, every wafer within a semiconductor fab will pass through a lithographic apparatus multiple times. With more than 20,000 sensors producing more than 700GB
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a0bb9414af8e947cc93cddb251cb99ea
https://doi.org/10.1117/12.2258039
https://doi.org/10.1117/12.2258039