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Effect of Substrate Temperature on the Properties of Hafnium Nitride Films Prepared by DC Sputtering
Autor:
Julián Hernández Torres, Cecilia Stephanie Loyo Vázquez, Andrés Alfonso Rodríguez Serrano, Leandro García-González, Nelly Flores Ramírez, Luis Zamora Peredo, Ayesha Margarita Courrech Arias
Publikováno v:
Advanced Materials Research. 976:124-128
Hafnium Nitride (HfN) thin films were fabricated by sputtering technique reaching a thickness of 250 nm. The substrate temperature was varied in 25, 100, 200, 300, 400 and 500 °C. Hardness, coefficient of friction, electrical resistivity and corrosi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::392c4e23748a9193a33ebfee513e71a1
https://doi.org/10.4028/www.scientific.net/amr.976.124
https://doi.org/10.4028/www.scientific.net/amr.976.124
