Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Cecilia E. Philbin"'
Autor:
Robert K. Henderson, Matt J. Lamantia, Jerry Xiaoming Chen, Cyrus E. Tabery, Amy A. Winder, Cecilia E. Philbin, Greg P. Hughes, Eugene A. DeLaRosa, John Riddick, Lloyd C. Litt, Azeddine Zerrade, Khoi A. Phan, Christopher A. Spence, Anthony Vacca, William A. Stanton, Scott Pomeroy, John Maltabes
Publikováno v:
21st Annual BACUS Symposium on Photomask Technology.
Repair and printability of 193nm alternating aperture phase shift masks have been studied in detail in an effort to understand the overall production capability of these masks for wafer production at the 100nm node and below.
Autor:
Kent G. Green, Cecilia E. Philbin, Sven Muehle, Sejal N. Chheda, Bill Wilkinson, Vishnu G. Kamat, Venkat R. Kolagunta
Publikováno v:
21st Annual BACUS Symposium on Photomask Technology.
As we move towards smaller dimensions and denser circuits, Model Based OPC has become a critical and indispensable tool to achieve feature fidelity for random logic and very small bitcell patterns. Model-Based OPC s used to overcome the effects due t
Publikováno v:
SPIE Proceedings.
The inorganic antireflection coating (AR3-chromium oxide) commonly used on photomask blanks was designed to minimize flare in h-line (405 nm) lithography steppers. The reflection of light (flare) off this coating (air-photomask) increases with shorte
Autor:
Clifford L. Henderson, Mike Pochkowski, Cecilia E. Philbin, C. Grant Willson, Franklin D. Kalk, Benjamen M. Rathsack, Cyrus Emil Tabery, Steven Scheer, Peter D. Buck
Publikováno v:
SPIE Proceedings.
The demand for smaller and more uniform features on photomasks is rapidly increasing. The complexity of these patterns is also increasing with the need for optical proximity correction and phase shifting structures. These complex mask features demand