Hypothetic impact of chemical bonding on the moisture resistance of amorphous SixNyHz by plasma-enhanced chemical vapor deposition

Autor: Catheline Cazako, Rodolphe Cauro, Alain Burr, Frédéric Georgi, Karim Inal

Publikováno v: Metallurgical Research & Technology
Metallurgical Research & Technology, EDP Sciences, 2018, 115 (4), pp.406. ⟨10.1051/metal/2018072⟩

The relationship between the microstructure of silicon nitride and its sensitivity to moisture was studied. The effectiveness of Si-H rich and N-H rich silicon nitride layers was measured under attack from water in vapor and liquid states. For water

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https://hal.archives-ouvertes.fr/hal-02968666/document