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Autor:
Zhang, Y., Haitjema, J., Liu, X., Johansson, F., Lindblad, A., Castellanos Ortega, S., Ottosson, N., Brouwer, A.M., Hohle, C.K.
Publikováno v:
Journal of Micro/Nanolithography, MEMS and MOEMS, 16(2):023510. SPIE
Advances in Patterning Materials and Processes XXXIV: 27 February–2 March 2017, San Jose, California, United States
Advances in Patterning Materials and Processes XXXIV
Advances in Patterning Materials and Processes XXXIV: 27 February–2 March 2017, San Jose, California, United States
Advances in Patterning Materials and Processes XXXIV
Several metal-containing molecular inorganic materials are currently considered as photoresists for extreme ultraviolet lithography (EUVL). This is primarily due to their high EUV absorption cross section and small building block size, properties whi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8a8972d5b1203d12536611d22729a587
http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-327125
http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-327125
Autor:
Fallica, R., Haitjema, J., Wu, L., Castellanos Ortega, S., Brouwer, F., Ekinci, Y., Panning, E.M., Goldberg, K.A.
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VIII: 27 February–2 March 2017, San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
Extreme Ultraviolet (EUV) Lithography VIII
The experimental measurement of the time-dependent absorption of photoresists at extreme ultraviolet wavelength is of great interest for the modeling of the lithographic process. So far, several technical challenges have made the accurate determinati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::672df16f9d7fed84e4ae6e8535b48b09
https://doi.org/10.1117/12.2257240
https://doi.org/10.1117/12.2257240
Autor:
Sharma, Ekta, Rathi, Reena, Misharwal, Jaya, Sinhmar, Bhavya, Kumari, Suman, Dalal, Jasvir, Kumar, Anand
Publikováno v:
Nanomaterials (2079-4991); Aug2022, Vol. 12 Issue 16, p2754-2754, 34p
Autor:
M. L. S. van der Geest, E. I. Wooning, L. Wu, T. M. Meerwijk, Peter M. Kraus, S. Castellanos Ortega, R. Bloem, Albert M. Brouwer, Najmeh Sadegh
Publikováno v:
Van Der Geest, M L S, Sadegh, N, Meerwijk, T M, Wooning, E I, Wu, L, Bloem, R, Castellanos Ortega, S, Brouwer, A M & Kraus, P M 2021, ' Extreme ultraviolet-excited time-resolved luminescence spectroscopy using an ultrafast table-top high-harmonic generation source ', Review of Scientific Instruments, vol. 92, no. 11, 113004, pp. 1-8 . https://doi.org/10.1063/5.0064780
Review of Scientific Instruments, 92(11):113004, 1-8. American Institute of Physics Publising LLC
Review of Scientific Instruments, 92(11):113004. American Institute of Physics
Review of Scientific Instruments, 92(11):113004, 1-8. American Institute of Physics Publising LLC
Review of Scientific Instruments, 92(11):113004. American Institute of Physics
We present a table-top extreme ultraviolet (XUV) beamline for measuring time- and frequency-resolved XUV-excited optical luminescence (XEOL) with additional femtosecond-resolution XUV transient absorption spectroscopy functionality. XUV pulses are ge
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cc2ce723a0de9f3cd1e95ee8d3ec3aa6
https://research.vu.nl/en/publications/0bb1949e-ca95-4cfa-964a-adf365bad0b2
https://research.vu.nl/en/publications/0bb1949e-ca95-4cfa-964a-adf365bad0b2
Publikováno v:
Nanomaterials (2079-4991); Aug2020, Vol. 10 Issue 8, p1593-1593, 1p