Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Carmela Amato-Wierda"'
Autor:
David B. Pillemer, Melissa D. Dongo, Kaitlin A. Camilleri, Michelle D. Leichtman, Jennifer E. Hogan, Carmela Amato-Wierda
Publikováno v:
Journal of Experimental Child Psychology. 156:1-15
A scientist taught 40 4- to 6-year-old children an interactive science lesson at school. The same day, children talked about the lesson at home with a parent who was naive to the details of what had transpired at school. Six days later, a researcher
Publikováno v:
2015 ASEE Annual Conference and Exposition Proceedings.
Publikováno v:
Surface and Coatings Technology. 148:256-261
Molecular beam mass spectrometry (MBMS) has been used to analyze the gas phase of Ar, Ar+TiCl 4 and Ar+TiCl 4 +NH 3 and CH 4 plasmas. The gas phase composition was analyzed as a function of pressure and plasma power. The results show that an increase
Autor:
Hua Xia Ji, Carmela Amato-Wierda
Publikováno v:
Surface and Coatings Technology. 148:262-267
TiWC thin films were deposited on stainless steel substrates (440C) by chemical vapor deposition (CVD) in a horizontal hot-wall reactor from a TiCl 4 W(CO) 6 CH 4 H 2 Ar gaseous mixture, at 1323 K and at pressures ranging from 0.13
Autor:
Carmela Amato-Wierda, Edward T. Norton
Publikováno v:
Surface and Coatings Technology. 148:251-255
Tetrakis(dimethylamino)titanium (TDMAT) is an important precursor for the metal-organic chemical vapor deposition (MOCVD) of TiN and TiSiN thin films, both of which are used as hard coatings. Understanding the kinetics and mechanism of the gas phase
Autor:
Edward T. Norton, Carmela Amato-Wierda
Publikováno v:
Chemistry of Materials. 13:4655-4660
Various aspects of the kinetics and mechanism occurring during the gas-phase thermal decomposition of Ti(N(CH3)2)4, tetrakis(dimethylamido)titanium, have been determined by in situ molecular beam mass spectrometry coupled to a chemical vapor depositi
Autor:
Carmela Amato-Wierda, Ijaz Jafri, Hui Zhang, V.L.K. Prasad, Marc Landry, Chandra M Reddy, Mohan Chandra, T.F. Ciszek
Publikováno v:
Journal of Crystal Growth. 225:330-334
A novel technique using silicon tubes for the production of bulk polysilicon via chemical vapor deposition is presented. Our experimental studies with a model reactor indicate that the polysilicon growth inside the silicon tube (15.3 g) exceeds that
Autor:
Carmela Amato-Wierda, Derk A. Wierda
Publikováno v:
Journal of Materials Research. 15:2414-2424
Hydrazine was used as a coreactant with tetrakis(dimethylamido)titanium for the low-temperature chemical vapor deposition of TiN between 50 and 200 °C. The TiN film-growth rates ranged from 5 to 45 nm/min. Ti:N ratios of approximately 1:1 were achie
Publikováno v:
Chemistry of Materials. 11:2775-2779
Molecular beam mass spectrometry has been used to observe the activation of silane, predominantly in the gas phase, during the chemical vapor deposition of Ti−Si−N thin films using Ti(NMe2)4, tetrakis(dimethylamido)titanium, silane, and ammonia a
Publikováno v:
ChemInform. 31