Zobrazeno 1 - 10
of 88
pro vyhledávání: '"Carlton G Willson"'
Autor:
Carlton G Willson, Christopher H. Chen, Ryan Deschner, Christopher W. Bielawski, Wontae Joo, Jonathan P. Moerdyk
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 57:1791-1795
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f0c25a05ff321355ab525b2560ac815c
https://doi.org/10.1002/pola.29449
https://doi.org/10.1002/pola.29449
Publikováno v:
Microelectronic Engineering. 116:44-50
A strong adhesion force between resist and underlayer materials was employed to reduce resist pattern peeling generated from de-molding in step-and-flash imprint lithography (SFIL), while simultaneously minimizing the adhesion force between resist ma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0be9bd9df332eedaeec4fc770e7a78b3
https://doi.org/10.1016/j.mee.2013.10.010
https://doi.org/10.1016/j.mee.2013.10.010
Autor:
Raymond J. Phaneuf, W. Bell, Tsung-Cheng Lin, Gottlieb S. Oehrlein, Carlton G Willson, Robert L. Bruce, Brian K. Long
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 28:751-757
The authors have studied the influence of Si–O bonding in the polymer structure of Si-containing resists on O2 plasma etch behavior. Three polymers were synthesized with the same Si wt % (12.1%) and varying number of Si–O bonds (0, 1, or 2). The
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e90dd57e31497644729b0fa897bab518
https://doi.org/10.1116/1.3455496
https://doi.org/10.1116/1.3455496
Publikováno v:
Langmuir. 23:1166-1170
The effects of template surface composition on fluorinated surfactant segregation were investigated for imprint lithography with photopolymerizable vinyl ether formulations. Heptadecafluoro-1,1,2,2-tetrahydrodecyl vinyloxy-methyloxy dimethylsilane, c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::51a50170c9e1939c517d760a73ced4ca
https://doi.org/10.1021/la061736y
https://doi.org/10.1021/la061736y
Publikováno v:
Langmuir. 21:11795-11801
Substrate hydration is demonstrated to be crucial to film quality during self-assembled (SA) film deposition of tridecafluoro-1,1,2,2,-tetrahydrooctyltrichlorosilane (FOTS) from the vapor phase. The surface hydration was studied by thermogravimetric
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6fb52cc6e193f5944804ca656cfd7431
https://doi.org/10.1021/la0516330
https://doi.org/10.1021/la0516330
Autor:
William J. Dauksher, D. J. Resnick, Kevin J. Nordquist, Todd Bailey, David P. Mancini, Carlton G Willson, S. Johnson, John G. Ekerdt, Sidlgata V. Sreenivasan
Publikováno v:
Microelectronic Engineering. 69:412-419
Step and flash imprint lithography (SFIL) is an attractive method for printing sub-100 nm geometries. Relative to other imprinting processes, SFIL has the advantage that the template is transparent, thereby facilitating conventional overlay technique
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2aab27ae086efe0aa8045afbd041bdc0
https://doi.org/10.1016/s0167-9317(03)00329-0
https://doi.org/10.1016/s0167-9317(03)00329-0
Autor:
David P. Mancini, Todd Bailey, Kevin J. Nordquist, K. Gehoski, John G. Ekerdt, Sidlgata V. Sreenivasan, Andy E. Hooper, Jeffrey H. Baker, L. Dues, William J. Dauksher, D. J. Resnick, S. Johnson, Carlton G Willson
Publikováno v:
Microelectronic Engineering. :221-228
Step and flash imprint lithography (SFIL) replicates patterns by using a transparent template with relief images etched into its surface. Recent work has examined alternative methods for template fabrication. One scheme incorporates a conductive and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::41f00df00ab66db40f241848d67afd96
https://doi.org/10.1016/s0167-9317(03)00075-3
https://doi.org/10.1016/s0167-9317(03)00075-3
Autor:
K. Gehoski, M. Meissl, William J. Dauksher, D. J. Resnick, Sidlgata V. Sreenivasan, Eric S. Ainley, Matthew E. Colburn, Jeffrey H. Baker, Byung Jin Choi, David P. Mancini, Kevin J. Nordquist, John G. Ekerdt, Todd Bailey, Carlton G Willson, A. Alec Talin, S. Johnson
Publikováno v:
Microelectronic Engineering. :461-467
Step and flash imprint lithography (SFIL) is an attractive method for printing sub-100 nm geometries. Relative to other imprinting processes, SFIL has the advantage that the template is transparent, thereby facilitating conventional overlay technique
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4fec9cc2beffe5dd4280a7a15270638a
https://doi.org/10.1016/s0167-9317(02)00462-8
https://doi.org/10.1016/s0167-9317(02)00462-8
Autor:
John G. Ekerdt, Sidlgata V. Sreenivasan, Carlton G Willson, Todd Bailey, S. Johnson, Douglas J. Resnick
Publikováno v:
Journal of Photopolymer Science and Technology. 15:481-486
The goal of the SFIL development program is to enable patterning of sub-100 nm features at room temperature and with minimal applied pressure. We believe the use of low viscosity materials and photopolymerization chemistry will enable SFIL to achieve
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d2103901e3fe4a175388c2cae42b481c
https://doi.org/10.2494/photopolymer.15.481
https://doi.org/10.2494/photopolymer.15.481
Publikováno v:
Chemistry of Materials. 11:2515-2519
The mechanism by which a tristable, laterally linked, SC* liquid crystal dimer reorients under the application of an electric field has been investigated by a combination of X-ray diffraction studies and torsional viscosity measurements. A new experi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8d88b8c95e9147377e9cc5cae3b87b5c
https://doi.org/10.1021/cm990218o
https://doi.org/10.1021/cm990218o