Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Carlo LaFiandra"'
Publikováno v:
SPIE Proceedings.
This paper examines the control of optical aberrations in an advanced step-and-scan system that uses catadioptric projection optics. Optical lithography will be required to print pattern features down to the 50 nm range. To achieve 50 nm, optical lit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e57e03cd2ac42964f008251dd1e0bcb0
https://doi.org/10.1117/12.435756
https://doi.org/10.1117/12.435756
Publikováno v:
SPIE Proceedings.
This paper examines the control of optical aberrations in an advanced step-and-scan system operating at 157 nm wavelength that uses catadioptric projection optics. Optical lithography will need to operate at K-factors approaching 0.33 using 157 nm wa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0e68ba4d15b7dd6b6b24d9723b4eb777
https://doi.org/10.1117/12.425216
https://doi.org/10.1117/12.425216
Autor:
Richard A. Sacks, Donald G. Bruns, John S. Toeppen, R. Zacharias, Bruce W. Woods, Mark A. Henesian, Janice K. Lawson, Lewis Van Atta, Scott Winters, Andrew Grey, Jeffrey A. Koch, Erlan S. Bliss, Carlo LaFiandra, J. Thaddeus Salmon, Mark Feldman
Publikováno v:
SPIE Proceedings.
A wavefront control system will be employed on NIF to correct beam aberrations that otherwise would limit the minimum target focal spot size. For most applications, NIF requires a focal spot that is a few times the diffraction limit. Sources of aberr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0595807b0671e0d8f0ac04bbdc9c6139
https://doi.org/10.1117/12.354181
https://doi.org/10.1117/12.354181
Conference
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