Výsledky vyhledávání - "Carl R. Kessel"

Self-Assembled Monolayers on Mica for Experiments Utilizing the Surface Forces Apparatus

Autor: Carl R. Kessel, Steve Granick, Hildegard M. Schneider, John Peanasky

Publikováno v: Langmuir. 11:953-962

Strongly bound, closely packed self-assembled monolayers of condensed alkyltriethoxysilanes were formed on mica and other substrates with a packing density of about 20 Az/molecule. Techniques to exploit these monolayers in the surface forces apparatu

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4866834c82e68554009361ca6559a2db
https://doi.org/10.1021/la00003a044

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Nanorheology of Confined Polymer Melts. 3. Weakly Adsorbing Surfaces

Autor: Steve Granick, Lenore L. Cai, Carl R. Kessel, John Peanasky

Publikováno v: Langmuir. 10:3874-3879

Polymer melts confined between weakly adsorbing surfaces terminated with methyl groups (closepacked self-assembled monolayers of condensed octadecyltriethoxysilane, OTE) were studied in regard to surface forces (static forces to compress the polymer

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::004d08c6d3a53ef79d9cc8a70044906b
https://doi.org/10.1021/la00022a078

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Formation and characterization of a highly ordered and well-anchored alkylsilane monolayer on mica by self-assembly

Autor: Carl R. Kessel, Steve Granick

Publikováno v: Langmuir. 7:532-538

A close-packed, well-ordered monolayer can be formed on a freshly cleaved muscovite mica surface by allowing hydrolyzed octadecyltriethoxysilane to self-assemble from a dilute hydrocarbon solution. The alkyl chains in the monolayer deposited by this

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b7f64211aa468341e2ef958e8cce48b2
https://doi.org/10.1021/la00051a020

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New ionic photo-acid generators (PAGs) incorporating novel perfluorinated anions

Autor: Terry Kruger, Gerald J. Lillquist, Yuri Cheburkov, Karrie S. Moorhouse, Yifan Zhang, Pat M. Savu, Carl R. Kessel, Steve Brinduse, Grant Birznieks, Thomas A. Kestner, Michael J. Parent, Michael C. Pallazzotto, William M. Lamanna

Publikováno v: SPIE Proceedings.

A new class of ionic photo-acid generators (PAGs) useful in chemically amplified photoresist formulations has been developed. The new PAGs are salts comprising a photoactive cation and a fluoroorganic sulfonylimide or sulfonylmethide anion. These hig

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4d467f9bca4c90490cfdec71b4532a30
https://doi.org/10.1117/12.474284

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Novel silicon-containing resists for EUV and 193-nm lithography

Autor: Steven J. Rhyner, Jonathan L. Cobb, Uzodinma Okoroanyanwu, Craig C. Henderson, Veena Rao, Larry D. Boardman, Carl R. Kessel

Publikováno v: SPIE Proceedings.

Two families of polymers have been prepared and evaluated as silicon-containing bilayer resist candidates at both 193 nm and 13.4 nm (EUV). Both families of polymers are based on a tertiary ester protecting group in which the ester group contains a s

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::74b9e83668430329ebd8b8c9cc3f5bca
https://doi.org/10.1117/12.350204

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Chemical aspects of silicon-containing bilayer resists

Autor: Larry D. Boardman, Steven J. Rhyner, Carl R. Kessel

Publikováno v: SPIE Proceedings.

We have prepare several novel silicon-containing polymers containing both low E a and high E a protecting groups, and we have evaluated these materials at both 193 nm. Low E a acetal-containing polymers were prepared by reacting poly(4-vinylphenol) w

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::71c68ab32d34c7210fc89621af15992a
https://doi.org/10.1117/12.350239

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