Zobrazeno 1 - 1
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pro vyhledávání: '"Carbon nitridide films"'
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 15:1970-1975
Amorphous carbon nitride thin films (a-CNx) have been deposited onto Si (100) substrates by using a rf diode sputtering system. The films were deposited in reactive nitrogen-argon atmospheres. The partial pressure of nitrogen ranged from 0% to 100% a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::93673b6b61fdc5f189c585dc36826ce9
https://doi.org/10.1116/1.580667
https://doi.org/10.1116/1.580667
