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pro vyhledávání: '"Camden Boyle"'
Autor:
Gordon Koerner, Quinton K. Wyatt, Brady Bateman, Camden Boyle, Matthias J. Young, Matthew R. Maschmann
Publikováno v:
Nano Select, Vol 3, Iss 10, Pp 1448-1457 (2022)
Abstract Area‐selective atomic layer deposition (AS‐ALD) techniques are an emerging class of bottom‐up nanofabrication techniques that selectively deposit patterned ALD films without the need for conventional top‐down lithography. To achieve
Externí odkaz:
https://doaj.org/article/1674e800d5744e0cb44006d8a25399ce
