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pro vyhledávání: '"Caitlin Smyth"'
Publikováno v:
Applied Sciences, Vol 11, Iss 5, p 2110 (2021)
We report on low-temperature and low-pressure deposition conditions of 140 °C and 1.5 mTorr, respectively, to achieve high-optical quality silicon nitride thin films. We deposit the silicon nitride films using an electron cyclotron resonance plasma-
Externí odkaz:
https://doaj.org/article/a85832a67c1a4dc2a7f4dbf69451ec89
Publikováno v:
Applied Sciences, Vol 11, Iss 2110, p 2110 (2021)
Applied Sciences
Volume 11
Issue 5
Applied Sciences
Volume 11
Issue 5
We report on low-temperature and low-pressure deposition conditions of 140 °C and 1.5 mTorr, respectively, to achieve high-optical quality silicon nitride thin films. We deposit the silicon nitride films using an electron cyclotron resonance plasma-
Autor:
Arani, Nitkunan, Bridget K, MacDonald, Ajay, Boodhoo, Andrew, Tomkins, Caitlin, Smyth, Medina, Southam, Fred, Schon
Publikováno v:
Clinical Medicine. 17:592-592