Zobrazeno 1 - 10
of 32
pro vyhledávání: '"C.I.M.A. Spee"'
Publikováno v:
Journal de Physique IV, Colloque, 9(PR8), 165-172. EDP Sciences
Results are reported of a study of the intrinsic kinetics of gas phase reactions. For this purpose a reactor system is designed in such a way that concentration and temperature variations throughout the reactor can be neglected enabling investigation
Autor:
P.A. van Nijnatten, C.I.M.A. Spee
Publikováno v:
Journal of Non-Crystalline Solids. 218:302-306
In this paper we discuss the methods for measuring directional optical properties of coated glass samples. Spectral data and reflectance and transmittance coefficients for visible daylight and solar radiation are presented, obtained for unpolarised r
Autor:
C.I.M.A. Spee, Z.A.E.P. Vroon
Publikováno v:
Journal of Non-Crystalline Solids. 218:189-195
The preparation of vanadium and tungsten oxide coatings is described using vanadium oxide tri-2-propoxide/2-propanol and tungsten penta-ethoxide/2-propanol solutions. These solutions are dip coated onto K-glass substrates and cured. For vanadium oxid
Autor:
Michael L. Hitchman, G.W. Andrews, B. Schulte, A. Brown, H. Jürgensen, G. Lengeling, T. Freltoft, P. Vase, Sarkis H. Shamlian, B.C. Richards, D.L. Pinch, Y.Q. Shen, S.L. Cook, C.I.M.A. Spee, J.L. Linden
Publikováno v:
Physica C: Superconductivity. 252:229-236
MOCVD of superconducting YBa 2 Cu 3 O 7δ thin films using the novel fluorinated barium β-diketonate complex [Ba(TDFND) 2 ·tetraglyme] 1 in combination with [Y(TMHD) 3 ] 2 and [Cu(TMHD) 2 ] is reported. The Ba complex has a low melting point (72°C
Publikováno v:
Surface and Coatings Technology. :1033-1037
Thermally and plasma-enhanced chemical vapour deposition of tungsten oxide from W(CO) 6 precursor and of vanadium oxide from VO(O i Pr) 3 has been performed in a low pressure research reactor. Microstructural evaluation (X-ray diffraction and X-ray p
Autor:
E.A. van der Zouwen, C.I.M.A. Spee, J.L. Linden, F. Verbeek, J.G. Kraaijkamp, H. Delhaye, H.A. Meinema, T. Rutten
Publikováno v:
Materials Science and Engineering: B. 17:108-111
Tungsten films are deposited by metal-organic chemical vapour deposition in a vertical hot-wall thermobalance reactor and a cold-wall stagnant flow reactor from Cp 2 WH 2 ( Cp ≡ cyclopentadienyl ) and CpW(CO) 3 CH 3 . Vapour pressure measurements s
Publikováno v:
Journal de Physique IV Proceedings
Journal de Physique IV Proceedings, EDP Sciences, 1991, 02 (C2), pp.C2-295-C2-302. ⟨10.1051/jp4:1991236⟩
Journal de Physique IV Proceedings, EDP Sciences, 1991, 02 (C2), pp.C2-295-C2-302. ⟨10.1051/jp4:1991236⟩
Y-Ba-Cu-oxides are deposited by MOCVD in a hot-wall reactor using the well known copper- and yttrium-β-diketonate precursors, Cu(thd)2 and Y(thd)3, and the novel barium precursor, Ba(hfa)2 tetraglyme. This novel barium precursor is thermally stable,
Autor:
R. Weiss, David W. Sheel, R. Tell, W. Graehlert, A. Beil, Ulrich Vogt, Philip A. Martin, Martyn E. Pemble, Volkmar Hopfe, C.I.M.A. Spee
Aiming towards process control of industrial high yield/high volume CVD reactors, the potential of optical sensors as a monitoring tool has been explored. The sensors selected are based on both Fourier transform infrared spectroscopy (FTIR) and tunab
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c513e6019507fffb4a55b2ee3803ba85
https://usir.salford.ac.uk/id/eprint/376/1/Sheel_2.pdf
https://usir.salford.ac.uk/id/eprint/376/1/Sheel_2.pdf
Autor:
J. P. A. M. Driessen, J.C. Schouten, A.M.B. van Mol, M.H.J.M. de Croon, J.L. Linden, C.I.M.A. Spee
Publikováno v:
Chemical Vapor Deposition, 3, 7, 101-104
Chemical Vapor Deposition, 7(3), 101-104. Wiley-VCH Verlag
Chemical Vapor Deposition, 7(3), 101-104. Wiley-VCH Verlag
The vapor pressure curves for CVD precursors for TiN coatings and SnO2 layers are presented. The precursors were Ti(NMe2)4 and Me3CTi(NMe2)3 for TiN and (C4H9)SnCl3, SnCl4, MeSnCl3, Me2SnCl2, Me3SnCl, and SnMe4 for the SnO2 system. No significant dec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::56f0c2491bb989f53f10080a19da7846
http://resolver.tudelft.nl/uuid:93c152d5-f2cc-4438-b544-477c6e5622a0
http://resolver.tudelft.nl/uuid:93c152d5-f2cc-4438-b544-477c6e5622a0