Zobrazeno 1 - 10
of 94
pro vyhledávání: '"C. d'Anterroches"'
Publikováno v:
Europhysics Letters (EPL). 75:455-460
We study theoretically the emergence of nanostructures in stressed multilayers. A non-linear amplitude expansion provides us with a simple argument on how the nanostructures emerging at the interfaces of the materials should behave. The criterion is
Autor:
Bertrand Nicolas, Odile I'Homme, Bernard Moreau, Gilbert Le Gall, Claire Lassudrie, C. d’Anterroches
Publikováno v:
Software Process: Improvement and Practice. 8:135-144
The needs and business goals of France Telecom R&D are centered around achieving enhanced customer satisfaction and greater competitiveness. These key management concerns become drivers that initiate software process improvement with goals of higher
Autor:
C. d'Anterroches, C. Bernardi
Publikováno v:
Journal of Non-Crystalline Solids. 187:369-373
Nitrided gate oxide layers have been characterized using electron energy loss spectroscopy coupled with a field emission gun electron microscope. It is demonstrated that quantitative analysis of nitrogen is possible with a high analytical spatial res
Autor:
Jean-Michel Gérard, C. d’Anterroches
Publikováno v:
Journal of Crystal Growth. 150:467-472
Segregation processes entail severe deviations from the nominal composition profiles of heterostructures grown by molecular beam epitaxy for most semiconductor systems. It is, however, possible to compensate exactly these effects, as shown here for I
Publikováno v:
Journal of Applied Physics. 75:223-226
A study of the growth of thin (20–30 A) silicon overlayers on erbium silicide films epitaxially grown on Si(111), using the solid phase epitaxy technique under ultrahigh vacuum conditions was made. The silicon overlayers were characterized in situ
Autor:
C. d’Anterroches, Jean-Michel Gérard
Publikováno v:
Microscopy Microanalysis Microstructures. 5:213-236
Publikováno v:
Journal of Crystal Growth. 127:536-540
We grow by molecular beam epitaxy and study by low temperature photoluminescence and high resolution electron microscopy pairs of identical AlAs/GaAs quantum wells, in which an InAs monolayer is inserted at nominally symmetric positions in the well,
Publikováno v:
Microscopy Microanalysis Microstructures. 4:5-21
In recent years the semiconducting phase of iron silicide 03B2-FeSi2 has attracted interest. Promising applications of a great deal of 03B2-FeSi2/Si heterojunctions are reported in semiconductor technology due to the 0.89 eV direct band gap of 03B2-F
Autor:
Béatrice Guenais, Alain Poudoulec, Vincent Durel, C. d’Anterroches, Yves Ballini, André Guivarc'h
Publikováno v:
Microscopy Microanalysis Microstructures. 3:299-312