Zobrazeno 1 - 10
of 66
pro vyhledávání: '"C. Weissmantel"'
Autor:
C. Weissmantel
Publikováno v:
Journal of Vacuum Science and Technology. 18:179-185
The structure and properties of thin solid films deposited in vacuum can be influenced substantially if additional energy and momentum is provided to the growing layers by energetic, inert or film‐forming species. Various ion beam configurations fo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b362581bd991803fb0eb7d0b0a4619ec
https://doi.org/10.1116/1.570719
https://doi.org/10.1116/1.570719
Publikováno v:
HTM Journal of Heat Treatment and Materials. 43:322-327
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c89f04e6038cb30921e87ee30a615311
https://doi.org/10.1515/htm-1988-430605
https://doi.org/10.1515/htm-1988-430605
Publikováno v:
Thin Solid Films. 100:383-389
Investigations of the ion-activated formation of hard carbon (i-C) films have demonstrated that the condensation of energetic particles may result in the growth of deposits with unusual more or less amorphous microstructure. In this context the quest
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0b9daf6216ba86d45b3958d75281a5dc
https://doi.org/10.1016/0040-6090(83)90163-3
https://doi.org/10.1016/0040-6090(83)90163-3
Autor:
W. Scharff, C. Weissmantel
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 4:3160-3164
Silicon on insulator (SOI) structures were produced by recrystallization of polycrystalline silicon deposited on thermally grown SiO2 using either a single‐flash lamp pulse or light strip scanning. In the latter case of lateral zone melting, encaps
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::698f5153c67541ee5e6f7adf9ff9905c
https://doi.org/10.1116/1.573646
https://doi.org/10.1116/1.573646
Publikováno v:
HTM Journal of Heat Treatment and Materials. 43:328-335
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c05f594491adc2d140abca0200d21d66
https://doi.org/10.1515/htm-1988-430606
https://doi.org/10.1515/htm-1988-430606
Autor:
C. Weissmantel, K. Hammer
Publikováno v:
Annalen der Physik. 497:432-444
Mit der Mikrowellen-Entladung bei Zyklotron-Resonanz ist eine effektive Plasma-Anregung moglich; es lassen sich Ionisationsgrade um 0,1 in Edel- und Reaktivgasen erreichen. Die Nutzung fur Ionenquellen bietet gegenuber der unselbstandigen Niederdruck
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e0fb2993310be870630cf3d941ba62bb
https://doi.org/10.1002/andp.19854970410
https://doi.org/10.1002/andp.19854970410
Publikováno v:
Physica Status Solidi (a). 100:553-557
Ion-plated boron nitride, which is a suitable hard coating material, is prepared with a wide range of deposition parameters and analysed by X-ray photoelectron Spectroscopy. Within a range of the atomic percent ratio N/B from 1 to 0.3 the N 1s and B
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3c6886262d4c7c362c917cb66117f9bb
https://doi.org/10.1002/pssa.2211000221
https://doi.org/10.1002/pssa.2211000221
Publikováno v:
HTM Journal of Heat Treatment and Materials. 43:336-339
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5377fdc54212df6006f3d764694bd19e
https://doi.org/10.1515/htm-1988-430607
https://doi.org/10.1515/htm-1988-430607
Autor:
R. Kögler, A. Wolf, J.-W. Erben, C. Hamann, J. Matthai, M. Heber, M. Voelskov, R. Klabes, W. Wieser, C. Weissmantel, W. Scharff
Publikováno v:
Thin Solid Films. 113:327-335
The growth of device-worthy silicon crystals on insulating substrates would offer a new type of semiconductor technology. Lateral epitaxial growth is demonstrated for several types of structures using island configurations of silicon deposited either
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d8db809c0acf231784ed70ab0204e6ac
https://doi.org/10.1016/0040-6090(84)90472-3
https://doi.org/10.1016/0040-6090(84)90472-3
Publikováno v:
Thin Solid Films. 149:225-235
This paper deals with theoretical and experimental investigations of the thickness distribution of thin films deposited by evaporation under an inert support gas at various pressures. This approach is considered as a first step to describe the materi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1bc128b34aa18bdc2224af64c8fd7ebb
https://doi.org/10.1016/0040-6090(87)90299-9
https://doi.org/10.1016/0040-6090(87)90299-9