Zobrazeno 1 - 10
of 32
pro vyhledávání: '"C. W. Wilkins"'
Autor:
John R. Barker, Scott Roy, L. Yang, Richard C W Wilkins, Asen Asenov, Mirela Boriçi, Jeremy R. Watling
Publikováno v:
Semiconductor Science and Technology. 19:1174-1182
This paper is based on a comprehensive review of the literature and our own studies. We present a summary of the theoretical models and related empirical expressions to evaluate parameters related to the carrier transport within Si/SiGe heterostructu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bdc8e56ce3818788e24fa684ce318c61
https://doi.org/10.1088/0268-1242/19/10/002
https://doi.org/10.1088/0268-1242/19/10/002
Publikováno v:
Physica Status Solidi (a). 147:477-490
In this study, dc magnetron sputtered WSi x films are characterized with RBS, SIMS, and TEM techniques. The films are deposited in a Varian 3180 sputtering system with the conmag WSi target 91-1209-05. Contaminations emitting from the shutter and cav
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6bae3743bf5ce97d9ceec998a2d55f3a
https://doi.org/10.1002/pssa.2211470218
https://doi.org/10.1002/pssa.2211470218
Publikováno v:
MRS Proceedings. 342
Sputtered deposited titanium films on silicon substrates were used to study the effects of first rapid thermal anneal temperature, duration of anneal time and thickness of the titanium films for TiSi2 formation. A central composite, coupled with a cr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fea81b93c6717b2871a9742ed771803f
https://doi.org/10.1557/proc-342-111
https://doi.org/10.1557/proc-342-111
Publikováno v:
Journal of Polymer Science: Polymer Chemistry Edition. 20:2661-2668
Copolymers of methyl methacrylate and 3-oximino-2-butanone methacrylate (OM) were investigated as deep-UV and e-beam resists. Their increased sensitivity relative to PMMA (up to 50 times) was correlated with the radiation chemical yields of the volat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8dcdf25b7b04dd14ddfa117700ef9cf9
https://doi.org/10.1002/pol.1982.170200924
https://doi.org/10.1002/pol.1982.170200924
Publikováno v:
Carbon. 21:111-116
Dynamic mass spectrometry was used to characterize the pyrolytic degradation of graphite and carbon black-phenolic resin composites. Measurements were obtained on the overall yield, composition and formation rates of the volatile pyrolysis products.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::908c6d117c1b2c533d1c7d93cfa4bf05
https://doi.org/10.1016/0008-6223(83)90165-3
https://doi.org/10.1016/0008-6223(83)90165-3
Publikováno v:
Thin Solid Films. 103:333-341
Uniform pinhole-free carbon films were prepared on silicon wafers, oxidized silicon wafers, sapphire and Al2O3 by the in situ thermal decomposition of a phenol-formaldehyde resin. Homogeneous and reproducible film thickness, in the range from 0.3 to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::87f66b1c4236ba68d52938c9661e1480
https://doi.org/10.1016/0040-6090(83)90589-8
https://doi.org/10.1016/0040-6090(83)90589-8
Publikováno v:
Journal of Polymer Science: Polymer Chemistry Edition. 21:1075-1083
Ortho-nitrobenzyl cholate esters have been successfully used as photosensitive components in solution inhibition deep UV photoresists. The photochemical behavior of a variety of substituted o-nitrobenzyl cholate derivaties has been examined and resis
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cca2d1513194624d8c40c1bddd55fa84
https://doi.org/10.1002/pol.1983.170210415
https://doi.org/10.1002/pol.1983.170210415
Publikováno v:
Canadian Journal of Chemistry. 61:817-823
The increasing density of devices in large scale integrated circuits has created a need for lithographic techniques that have higher resolution (≈1 μm) than can be achieved with conventional (≈400 nm) optical technology. By operating in the deep
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8dd543044b7251c95969553302eed477
https://doi.org/10.1139/v83-149
https://doi.org/10.1139/v83-149
Publikováno v:
Journal of Vacuum Science and Technology. 16:1997-2002
The lithographic characteristics of homopolymers and copolymers of substituted styrenes have been determined by electron lithography and compared to polystyrene, which is used as a standard for high contrast among negative resists. Homopolymers, as w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fabc76f5f95a21cbc2217d544821db2b
https://doi.org/10.1116/1.570376
https://doi.org/10.1116/1.570376
Publikováno v:
Journal of Vacuum Science and Technology. 19:1338-1342
We have developed a two‐component (resin‐solution inhibitor) resist system having good photosensitivity in the 230–300 nm range. The resin is an optically transparent methyl methacrylate‐methacrylic acid copolymer that is soluble in aqueous a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::31c19e7cd105e2b36b1638a76bf0fe38
https://doi.org/10.1116/1.571272
https://doi.org/10.1116/1.571272