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Publikováno v:
SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest.
This paper demonstrates a methodology for systematic calibration of models in process simulators and its impact on improvement of accuracy and predictive capability of a TCAD system. A software tool for calibration with numerical optimization has bee
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4bde7bf4360560f4d2232cde62395f05
https://doi.org/10.1109/sispad.1997.621390
https://doi.org/10.1109/sispad.1997.621390
