Zobrazeno 1 - 10
of 137
pro vyhledávání: '"C. R. Eddy"'
Autor:
Nabil Bassim, R.L. Henry, M. Fatemi, D. K. Gaskill, C. R. Eddy, Mark Twigg, Michael A. Mastro, James C. Culbertson, Ronald T. Holm
High-reflectance group III-nitride distributed Bragg reflectors (DBRs) were deposited by MOCVD on Si (111) substrates. A reflectance greater than 96% was demonstrated for the first time for an AlN/GaN DBR with a stop-band centered in the blue-green r
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ca70bec0a5f5d50df22150ed474db4e9
http://arxiv.org/abs/2009.01207
http://arxiv.org/abs/2009.01207
Autor:
C. R. Eddy, Michael A. Mastro, Travis J. Anderson, Joelson André de Freitas, James C. Gallagher, Lunet E. Luna, Jennifer K. Hite
Publikováno v:
Journal of Crystal Growth. 498:352-356
The availability of high quality, free-standing GaN substrates enables new device applications in III-nitrides, especially for vertical device structures. With the introduction of these native substrates, the properties of nitrides are no longer domi
Autor:
Alok Mukherjee, Chase T. Ellis, Guandong Wang, D. Kurt Gaskill, M. M. Arik, Youyan Liu, Joseph G. Tischler, C. R. Eddy, P. Fowler, Hao Zeng, E. Oliverio, Evan R. Glaser, Joseph L. Tedesco, R. L. Myers-Ward, Payam Taheri, J. Cerne
Publikováno v:
Physical Review B. 99
We report a giant enhancement of the mid-infrared (MIR) magneto-optical complex Kerr angle (polarization change of reflected light) in a variety of materials grown on SiC. In epitaxially-grown multilayer graphene, the Kerr angle is enhanced by a fact
Autor:
Tatyana I. Feygelson, Eugene A. Imhoff, Jennifer K. Hite, Marko J. Tadjer, Fritz J. Kub, Bradford B. Pate, Andrew D. Koehler, Travis J. Anderson, C. R. Eddy, Karl D. Hobart
Publikováno v:
ECS Journal of Solid State Science and Technology. 6:Q3036-Q3039
Autor:
Karl D. Hobart, Lunet E. Luna, R. L. Myers-Ward, James C. Gallagher, Michael A. Mastro, C. R. Eddy, Travis J. Anderson, Jennifer K. Hite
Publikováno v:
ECS Journal of Solid State Science and Technology. 6:S3103-S3105
Publikováno v:
Scripta Materialia. 93:44-47
Recent results on atomic layer epitaxy (ALE) growth and characterization of (0 0 0 1)AlN on highly oriented (1 1 1)Pt layers on amorphous HfO2/Si(1 0 0) are reported. HfO2 was deposited by atomic layer deposition on Si(1 0 0) followed by ALE growth o
Autor:
Paul Thibado, J. K. Schoelz, Mehdi Neek-Amal, P. Xu, D. K. Gaskill, D. Qi, C. R. Eddy, François M. Peeters, Virginia D. Wheeler, Luke O. Nyakiti, R. L. Myers-Ward, Josh Thompson
Publikováno v:
Carbon
Epitaxial graphene is grown on a non-polar n(+) 6H-SiC m-plane substrate and studied using atomic scale scanning tunneling microscopy. Multilayer graphene is found throughout the surface and exhibits rotational disorder. Moire patterns of different s
Autor:
Luke O. Nyakiti, N. A. Mahadik, D. K. Gaskill, Eugene A. Imhoff, C. R. Eddy, Robert E. Stahlbush, Karl D. Hobart, R. L. Myers-Ward, Virginia D. Wheeler
Publikováno v:
Crystal Growth & Design. 14:5331-5338
The conversion of basal plane dislocations (BPDs) to electrically benign threading edge dislocations in 4° off-axis 4H–SiC epilayers has been investigated using ultraviolet photoluminescence imaging. The conversion spontaneously occurred throughou
Autor:
Harry M. Meyer, Jennifer K. Hite, T. Hossain, N.Y. Garces, C. R. Eddy, Neeraj Nepal, Daming Wei, James H. Edgar
Publikováno v:
physica status solidi c. 11:898-901
This study compares the physical, chemical and electrical properties of Al2O3 thin films deposited on gallium polar c- and nonpolar m -plane GaN substrates by atomic layer deposition (ALD). Correlations were sought between the film's structure, compo