Influence of powder mixing method on properties of high entropy alloys of FeCrMnAlMo thin coatings obtained by magnetron sputtering

Autor: Y.Y. Santana, M.A. Sow, C. Nouvellon, C. Cordier, F. Beclin, M. Touzin, A. Tromont, X. Noirfalise, L. Boilet, J.F. Trelcat, M. Dubar, H. Morvan, M. Bigerelle

Publikováno v: Surface and Coatings Technology
Surface and Coatings Technology, 2022, Surface and Coatings Technology, 446, pp.128744. ⟨10.1016/j.surfcoat.2022.128744⟩

International audience; High Entropy Alloys of FeCrMnAlMo thin coatings obtained by magnetron sputtering were studied. The influence of the powder mixing method to obtain the targets used in the physical vapor deposition reactors was evaluated concer

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::48fffe4ae6de1c6dfaf3210f6b7e1aee
https://hal.univ-lille.fr/hal-03767586

WC/C:H films synthesized by an hybrid reactive magnetron sputtering/Plasma Enhanced Chemical Vapor Deposition process: An alternative to Cr (VI) based hard chromium plating

Autor: L. Libralesso, Roberto Lazzaroni, R. Belchi, Olivier Douhéret, C. Nouvellon, Damien Thiry, Rony Snyders

Publikováno v: Thin Solid Films. 630:79-85

WC/C:H thin films have been synthesized by a hybrid Plasma Enhanced Chemical Vapor Deposition/Physical Vapor Deposition method consisting in the reactive sputtering of a tungsten target in Ar-C2H2 atmospheres. The influence of the gas mixture on the

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::a0d5227987aa4c5fade13f3da8c1387e
https://doi.org/10.1016/j.tsf.2016.09.002

Excimer laser ablation of thin titanium oxide films on glass

Autor: S. Dinu, C. Nouvellon, M. Wautelet, Grégory Guisbiers, F. Monteverde, O. Van Overschelde

Publikováno v: Applied Surface Science. 252:4722-4727

Thin titanium dioxide films are deposited on glass substrates by magnetron sputter deposition. They are irradiated in air, by means of a KrF excimer laser. The ablation rate is measured as a function of the laser fluence per pulse, F, and of the numb

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4b982632603972305f285135f93ab4ac
https://doi.org/10.1016/j.apsusc.2005.07.147

RF amplified magnetron source for efficient titanium nitride deposition

Autor: C. Nouvellon, Stephanos Konstantinidis, Michel Hecq, M. Wautelet, J.P. Dauchot

Publikováno v: Surface and Coatings Technology. :100-106

Amplified magnetron sources are used to increase the ionization ratio of the sputtered metallic species in a way to avoid shadowing effect during thin film deposition on complex substrates. An radio-frequency (RF) power supplied coil achieves the amp

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::f32a294902082d414054791cc290ede8
https://doi.org/10.1016/s0257-8972(03)00528-0

Density and temperature in an inductively amplified magnetron discharge for titanium deposition

Autor: A. Ricard, Stephanos Konstantinidis, M. Hecq, Jean-Pierre Dauchot, M. Wautelet, C. Nouvellon

Publikováno v: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 20:1488-1491

In order to determine the titanium neutral density, a direct current (dc) plasma discharge, amplified by a radio-frequency (rf) coil, was studied by absorption spectrometry. The argon pressure varied from 5 to 40 mTorr. The dc and rf powers varied be

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4b4a02fa4ea177a2dfcbaa1b0befcff4
https://doi.org/10.1116/1.1488948