Zobrazeno 1 - 10
of 12
pro vyhledávání: '"C. Neil Berglund"'
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 22:499-506
A survey-based, empirical study that benchmarks the productivity of photomask manufacturers has led to some significant conclusions. First, the wide variation in the productivity indicators from company to company suggests that all participants may h
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b99bb139f25f682c09ea1a6e3023fbe1
https://doi.org/10.1109/tsm.2009.2031785
https://doi.org/10.1109/tsm.2009.2031785
Autor:
Zeting Pei, C. Neil Berglund
Publikováno v:
Japanese Journal of Applied Physics. 41:L52-L54
The angular distribution of photoemission from gold thin films was studied in this paper. A theoretical model of angular distribution was first developed. Experimental measurement was then carried out from a simple set-up. The measured angular distri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0f95a1c3f52179edd84832183d5424c2
https://doi.org/10.1143/jjap.41.l52
https://doi.org/10.1143/jjap.41.l52
Autor:
C. Neil Berglund
Publikováno v:
SPIE Proceedings.
Semiconductor industry yield trends from the 500 nm generation are described that illustrate traditional random defect yield loss mechanisms have been found to be less and less important relative to the yield loss caused by systematic and primarily n
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b8c413fe740c0b1e8de836cd7f2b6c2e
https://doi.org/10.1117/12.497494
https://doi.org/10.1117/12.497494
Autor:
T. Vucurevich, K. Shimasaki, Ahmad Chatila, M. Bales, Mitchell D. Heins, C. Neil Berglund, Victor Vladimir Boksha, F. James, J. Hogan, Robert C. Pack, D. Cottrell
Publikováno v:
SPIE Proceedings.
In this paper we review current design-to-silicon manufacturing challenges and complexities confronting the IC design and manufacturing worlds as the industry prepares for sub-100nm technology node IC production and discuss a simplifying infrastructu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::abbf83b05c696ad2a6520ab7f2b2067a
https://doi.org/10.1117/12.475667
https://doi.org/10.1117/12.475667
Publikováno v:
SPIE Proceedings.
Integrated circuits are becoming more sensitive to overlay errors between the most critical layers. This paper focuses on inter-transistor overlay variations, which are defined as the short-range variations of overlay between transistors separated by
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7955b9f1d5c26651bb354d2b970998ca
https://doi.org/10.1117/12.436776
https://doi.org/10.1117/12.436776
Publikováno v:
SPIE Proceedings.
Photocathodes have been proposed as a technology for achieving multiple independently modulated electron beams foradvanced electron-beam lithography applications. Thin-film gold photocathodes are ofparticular interest because they offerthe potential
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0ee451ffe95a277bf4d81f75cc5f8c6a
https://doi.org/10.1117/12.373346
https://doi.org/10.1117/12.373346
Autor:
Corina Tanasa, C. Neil Berglund, Roger Fabian W. Pease, D. S. Pickard, Mark A. McCord, Min Bai
Publikováno v:
SPIE Proceedings.
Electron beam exposure of masks and wafers results in charging of the insulting resist film. This charging results in an electric field which deflects incoming electrons and can be a serious source of pattern placement error in electron-beam lithogra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b243818ed45bcbc1efb635445216b21b
https://doi.org/10.1117/12.332874
https://doi.org/10.1117/12.332874
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography X.
A two-dimensional self-calibration experiment obtains Cartesian traceability for high-precision tools. The calibration procedure incorporates group theory principles to solve our industry's two-dimensional calibration problem. With group theory, a Ca
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8b6e5f9f4678942995c44c4598d02872
https://doi.org/10.1117/12.240149
https://doi.org/10.1117/12.240149
Autor:
C. Neil Berglund
Publikováno v:
64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review.
An overview is provided of the technologies and architectures incorporated into commercial pattern generators as they apply to current and expected state-of-theart reticle requirements, and a fundamental assessment and comparison is made of the vario
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8459055dccc62b29d053892d31d2f0ee
https://doi.org/10.1117/12.177441
https://doi.org/10.1117/12.177441
Publikováno v:
SPIE Proceedings.
Even at 0.5 micrometers design rules, the specifications on 5X reticles are set extremely tightly, on the grounds that ULSI patterns are so complex that tight specifications are essential to obtain acceptable yield. It is usually assumed that these s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4f7b89204bb03ff8ed31af76254f0b87
https://doi.org/10.1117/12.142149
https://doi.org/10.1117/12.142149