Zobrazeno 1 - 3
of 3
pro vyhledávání: '"C. H. Chadwick"'
Publikováno v:
Cytopathology. 10:97-106
Fine needle cytology of palpable head and neck lesions: a comparison of sampling methods with and without suction Patients attending the ear, nose and throat (ENT) department at St James's University Hospital, Leeds, UK, for evaluation of palpable he
Autor:
W. Squires, C. H. Chadwick, W. D. Meisburger, D. J. Clark, R. R. Simmons, J. E. McMurtry, S. Squires, Lee H. Veneklasen, A. Chitayat, M. Levine
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 10:2638
The design and performance of an X–Y stage for fast electron‐beam inspection of wafers and x‐ray masks is described. The inspection technique involves the comparison of images that are acquired by the raster scan acquisition of long swath image
Autor:
C.‐S. Pan, M. Robinson, D. J. Clark, J. Taylor, Alan D. Brodie, H. J. Dohse, L. S. Chuu, R. E. Paul, D. G. Emge, D. E. A. Smith, B. G. Becker, J. E. McMurtry, Lee H. Veneklasen, J. K. H. Rough, J. D. Greene, A. A. Desai, C. H. Chadwick, W. D. Meisburger, Jau Jack Y, M. Y. Ling, R. R. Simmons, P. A. Wieczorek, S. C. Wong, L. A. Honfi, P. Sandland, Zhongwei Chen, A. Dutta, S. G. Lele
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 9:3005
SEMSpec is a scanning electron‐beam inspection system designed for high‐resolution die‐to‐die inspections of conductive x‐ray masks, wafer prints, or stencil masks in a production environment. The inspection sensitivity can be varied from 9