Zobrazeno 1 - 10
of 406
pro vyhledávání: '"C. GRANT WILLSON"'
Autor:
Julia D, Cushen, Kadhiravan, Shanmuganathan, Dustin W, Janes, C Grant, Willson, Christopher J, Ellison
Publikováno v:
ACS macro letters. 3(9)
Self-assembly characteristics of amphiphilic macromolecules into micelles, nanoparticles and vesicles has been of fundamental interest for many applications including designed nanoscale therapeutic delivery systems and enzymatic reactors. In this wor
Autor:
Dustin W. Janes, Christopher M. Bates, Lane Austin, C. Grant Willson, Christopher J. Ellison, Michael J. Maher, Matthew C. Carlson, Gregory Blachut, Jeffrey L. Self, William J. Durand
Publikováno v:
ACS macro letters. 3(8)
Directly photopatternable interfaces are introduced that facilitate two-dimensional spatial control of block copolymer (BCP) orientation in thin films. Copolymers containing an acid labile monomer were synthesized, formulated with a photoacid generat
Autor:
Heonjoo Ha, Emmanuel Urandu Mapesa, C. Grant Willson, Henry L. Cater, Qingjun Zhu, Michael J. Maher, Nathaniel A. Lynd, Yusuke Asano, Christopher J. Ellison, Joshua Sangoro, Jai Hyun Koh, Sung-Soo Kim
Publikováno v:
Macromolecules. 53:5504-5511
During the course of studying silicon-containing diblock copolymers, it was discovered that poly(3,5-di(trimethylsilyl)styrene)-block-poly(3,4-methylenedioxystyrene) (PDTMSS-b-PMDOS) showed very un...
Autor:
Matthew C. Carlson, Daniel F. Sunday, Charles T. Rettner, Philip Liu, Ji Yeon Kim, Joy Cheng, R. Joseph Kline, C. Grant Willson, Christopher J. Ellison, Michael J. Maher, Nathaniel A. Lynd, Carlos R. Baiz, Gregory Blachut, Christopher M. Bates, Yusuke Asano, Devon H. Callan, Daniel P. Sanders
Publikováno v:
ACS Applied Materials & Interfaces. 12:23399-23409
Polarity-switching photopatternable guidelines can be directly used to both orient and direct the self-assembly of block copolymers. We report the orientation and alignment of poly(styrene-block-4-...
Autor:
Jan Doise, Christopher J. Ellison, C. Grant Willson, Paulina Rincon Delgadillo, Natsuko Kinoshita, Jai Hyun Koh, Hyo Seon Suh, Qingjun Zhu, Ji Yeon Kim, Geert Vandenberghe
Publikováno v:
ACS Applied Materials & Interfaces. 11:48419-48427
Directed self-assembly (DSA) of high-χ block copolymer thin films is a promising approach for nanofabrication of features with length scale below 10 nm. Recent work has highlighted that kinetics are of crucial importance in determining whether a blo
Publikováno v:
Journal of the American Chemical Society. 141:14736-14741
Preparation of an unzipping polyester is reported. The monomer was prepared from benzoic acid in a four-step sequence. Step growth polymerization of the monomer provides the target polymer. Efficient depolymerization upon irradiation at 254 nm was co
Autor:
Michael J. Maher, C. Grant Willson, Summer Tein, Christopher J. Ellison, R. Joseph Kline, Christopher Liman, Adam F. Hannon, Gregory Blachut, Daniel F. Sunday, Yusuke Asano
Publikováno v:
Macromolecules. 51:173-180
Advancements in the directed self-assembly of block copolymers (BCPs) have prompted the development of new materials with larger effective interaction parameters (χe). This enables BCP systems with phase separation at increasingly small degrees of p
Autor:
Yasunobu Someya, Christopher J. Ellison, Lane Austin, C. Grant Willson, XiaoMin Yang, Yusuke Asano, Stephen M. Sirard, Gregory Blachut, Akhila Mallavarapu, Michael J. Maher
Publikováno v:
ACS Nano. 11:7656-7665
The directed self-assembly (DSA) and pattern transfer of poly(5-vinyl-1,3-benzodioxole-block-pentamethyldisilylstyrene) (PVBD-b-PDSS) is reported. Lamellae-forming PVBD-b-PDSS can form well resolved 5 nm (half-pitch) features in thin films with high
Autor:
Jan Doise, Natsuko Ito, Gregory Blachut, Arjun Singh, Mizuochi Ryuta, Lane Austin, Yasunobu Soymeya, C. Grant Willson, Dustin W. Janes, Paulina Rincon Delgadillo, Geert Vandenberghe, Christopher J. Ellison, Yusuke Asano
Publikováno v:
Journal of Photopolymer Science and Technology. 30:187-190
Autor:
William J. Durand, Stephen M. Sirard, Christopher M. Bates, Gregory Blachut, Yusuke Asano, Michael J. Maher, Roel Gronheid, Yasunobu Someya, Andrew M. Dinhobl, Christopher J. Ellison, Lane Austin, C. Grant Willson, Diane J. Hymes
Publikováno v:
Chemistry of Materials. 28:8951-8961
The directed self-assembly (DSA) of a 20 nm full-pitch silicon-containing block copolymer (BCP), poly(4-methoxystyrene-b-4-trimethylsilylstyrene), was performed using a process that produces shallow topography for hybrid chemo-/grapho-epitaxy. This h