Zobrazeno 1 - 10
of 11
pro vyhledávání: '"C. F. Aliotta"'
Publikováno v:
Journal of The Electrochemical Society. 128:1971-1974
The effects of excess phosphorous on plasma etching of polycrystalline silicon were studied by SEM and TEM. The phosphorous levels were altered by the time duration of deposition, by the presence or absence of a phosphosilicate glass layer during hig
Autor:
Maria Ronay, C. F. Aliotta
Publikováno v:
Philosophical Magazine A. 42:161-184
Lead films varying in thickness and grain size were deposited from the vapour onto substrates varying in their coefficient of thermal expansion. This way both the yield stress of the films and the thermal stress arising from temperature change could
Publikováno v:
Journal of Electronic Materials. 4:497-515
Aluminum thin film conductors containing Mg alloying additions have been tested for electromigration failure by formation of electrically open circuits. The test conditions were either 2 × 106 A/cm2 or 4 × 106 A/cm2 for the current density, and eit
Publikováno v:
Thin Solid Films. 93:309-319
An electron-beam-induced voltage (EBIV) technique has been developed to measure the barrier height of Schottky diodes. The principle of this technique is described and is compared with the conventional electron-beam-induced current (EBIC) technique.
Publikováno v:
Journal of Applied Physics. 53:4919-4927
Thin layers of La, Y, Au, Pd, Pt, Ag, and Sn were evaporated at room temperature as nucleants prior to the evaporation of 2000 A Pb. The correlations of grain size, surface morphology, and the phase diagrams of lead nucleant showed that the grain siz
Autor:
Oliver C. Wells, C. F. Aliotta
Publikováno v:
Scanning. 2:257-259
Autor:
C. F. Aliotta, G. J. Clark, T. O. Sedgwick, Stephan A. Cohen, Z. A. Weinberg, William A. Lanford, Vaughn R. Deline
Publikováno v:
Applied Physics Letters. 43:1105-1107
During recrystallization of encapsulated silicon films on SiO2, by the graphite strip heater technique, the silicon sometimes breaks apart and agglomerates into small beads or stripes. By secondary ion mass spectroscopy analysis, it was found that a
Publikováno v:
Applied Physics Letters. 41:54-56
We demonstrate that electron‐beam induced voltage (EBIV) technique can be used for direct measurement of Schottky (or p‐n junction) barrier height. Schottky barrier heights of PtSi, Pd2Si, and TiSi2 on n‐type (111) Si measured by this technique
Autor:
G. E. Brock, C. F. Aliotta
Publikováno v:
IBM Journal of Research and Development. 6:372-374
Autor:
A. E. Blakeslee, C. F. Aliotta
Publikováno v:
IBM Journal of Research and Development. 14:686-688
Multiple closely spaced layers of GaAs1-xPx, which approximate a one-dimensional crystalline superlattice, have been created by periodically pulsing PH3 into an AsH3-PH3-Ga-HCl vapor-growth apparatus. The phosphorus mole fraction varies between maxim