Zobrazeno 1 - 9
of 9
pro vyhledávání: '"C. D. Lamp"'
Autor:
B. Hitti, C. D. Lamp, Kim H. Chow, T. L. Estle, R. L. Lichti, J. W. Schneider, S. R. Kreitzman, Philippe Mendels
Publikováno v:
Hyperfine Interactions. 86:673-679
The radio frequencyμSR technique developed at TRIUMF was used to measure the temperature dependence of the diamagnetic muon, Mu, and Mu* amplitudes in silicon between 10 K and 500 K. Six samples doped with phosphorus (n-type) and boron (p-type) in t
Autor:
C. D. Lamp, S. Yang
Publikováno v:
Physical Review B. 49:1690-1695
The symmetry of the EL2 center in n-type liquid-encapsulated Czochralski GaAs is investigated through numerical fitting of capacitance transients measured under uniaxial stress. From experimental data which superficially appears compatible with ${\ma
Autor:
S. Yang, C. D. Lamp
Publikováno v:
Journal of Applied Physics. 74:6636-6641
A numerical fitting method based on the deep level transient spectroscopy (DLTS) technique is presented. This method deals with a situation where the standard rate window DLTS is no longer sufficient, i.e., the assumption that the defect density NT i
Autor:
S. R. Kreitzman, R. F. Kiefl, J. W. Schneider, Bassam Hitti, R. L. Lichti, S.A. Dodds, Ch. Niedermayer, Kim H. Chow, C. D. Lamp, T. Pfiz, R.C. Duvarney, T.L. Estle
Publikováno v:
Materials Science Forum. :1115-1120
Autor:
D. J. James, C. D. Lamp
Publikováno v:
Applied Physics Letters. 62:2081-2083
Oxygen‐related thermal donor formation in Czochralski silicon is characterized by the capacitance‐voltage and deep level transient spectroscopy techniques as a function of 450 °C anneal time following hydrogenation. Increases in the formation ra
Publikováno v:
Physical Review Letters. 51:1286-1289
Etude du niveau E c -0,17 eV du silicium irradie par des neutrons, par spectroscopie transitoire sous contrainte uniaxiale. Determination de la symetrie des defauts, de la redistribution electronique induite par la contrainte et de l'orientation pref
Publikováno v:
Review of Scientific Instruments. 55:210-212
An apparatus for applying uniaxial stress >109 Pa at temperatures of 20–300 K is described. The apparatus is used with a deep level transient spectroscopy (DLTS) experiment, but it has more general applications. We have used this apparatus to obser
Autor:
N. Hamaguchi, P. Russell, T. P. Humphreys, D. L. Dreifus, C. D. Lamp, A. A. Tuttle, Nadia A. El-Masry, Salah M. Bedair, Y. Lo
Publikováno v:
Applied Physics Letters. 49:942-944
Several superlattice structures, grown by molecular beam epitaxy, have been used to reduce the density of threading dislocations originating from the GaAs substrate. Results clearly indicate that compared to epitaxial layers grown directly on GaAs su
Publikováno v:
Applied Physics Letters. 41:1063-1065
A new variation of the deep level transient spectroscopy technique is presented. In the new approach, the current transient is integrated, yielding a charge transient. A simple circuit for integrating the current is given and is analyzed. The charge