Zobrazeno 1 - 1
of 1
pro vyhledávání: '"C. B. Pcethala"'
Autor:
Paul S. McLaughlin, Thomas J. Haigh, Devika Sil, Huai Huang, Nicholas A. Lanzillo, Raghuveer R. Patlolla, Pranita Kerber, Hosadurga Shobha, James Chingwei Li, C. B. Pcethala, Yongan Xu, Donald F. Canaperi, James J. Demarest, Elbert E. Huang, Chanro Park, Clevenger Leigh Anne H, Benjamin D. Briggs, Licausi Nicholas, Jae Gon Lee, M. Ali, Son Nguyen, Young-Wug Kim, Theodorus E. Standaert, C. T. Le, G. Lian, Griselda Bonilla, Errol Todd Ryan, Han You, David L. Rath
Publikováno v:
2018 IEEE International Interconnect Technology Conference (IITC).
As BEOL pitch continues to aggressively scale, contributions from pattern dimension and edge placement constrict the available geometry of interconnects. In particular, the critical minimum insulator spacing which defines a technologies max operating
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1274e1c098e6a464c29d7db0ba284e69
https://doi.org/10.1109/iitc.2018.8430476
https://doi.org/10.1109/iitc.2018.8430476
