Zobrazeno 1 - 10
of 19
pro vyhledávání: '"C. A. Cockrum"'
Publikováno v:
Journal of Electronic Materials. 28:705-711
We review the rapid progress that has been made during the past three years in the heteroepitaxial growth of HgCdTe infrared detector device structures on Si substrates by molecular-beam epitaxy. The evolution of this technology has enabled the fabri
Autor:
G. M. Venzor, Rajesh D. Rajavel, O. K. Wu, M. S. Smith, T. J. de Lyon, J. A. Vigil, Steven L. Bailey, J. E. Jensen, I. Kasai, Scott M. Johnson, C. A. Cockrum, W. L. Ahlgren
Publikováno v:
Journal of Electronic Materials. 27:550-555
Molecular beam epitaxy has been employed to deposit HgCdTe infrared detector structures on Si(112) substrates with performance at 125K that is equivalent to detectors grown on conventional CdZnTe substrates. The detector structures are grown on Si vi
Autor:
T. J. de Lyon, Rajesh D. Rajavel, J. E. Jensen, Scott M. Johnson, O. K. Wu, C. A. Cockrum, G. M. Venzor
Publikováno v:
Journal of Electronic Materials. 25:1341-1346
High-quality, single-crystal epitaxial films of CdTe(112)B and HgCdTe(112)B have been grown directly on Si(112) substrates without the need for GaAs interfacial layers. The CdTe and HgCdTe films have been characterized with optical microscopy, x-ray
Autor:
Scott M. Johnson, O. K. Wu, C. A. Cockrum, Rajesh D. Rajavel, Peter D. Brewer, D. M. Jamba, G. M. Venzor, J. E. Jensen, John A. Roth
Publikováno v:
Journal of Electronic Materials. 25:1411-1415
A robust process has been developed for the reproducible growth of in-situ doped Hg1−xCdxTe:As alloys by molecular beam epitaxy. Net hole concentrations in excess of 5 x 1017 cm−3, with peak mobilities >200 cm2/Vs were measured in Hg0.74Cd0.26Te:
Autor:
L. M. Ruzicka, Bonnie A. Baumgratz, Scott M. Johnson, William J. Hamilton, C. A. Cockrum, O. K. Wu, T. Tung, F. I. Gesswein, T. J. de Lyon, John A. Roth
Publikováno v:
Journal of Electronic Materials. 24:467-473
Direct epitaxial growth of high-quality 100lCdZnTe on 3 inch diameter vicinal {100}Si substrates has been achieved using molecular beam epitaxy (MBE); a ZnTe initial layer was used to maintain the {100} Si substrate orientation. The properties of the
Autor:
Scott M. Johnson, K. Kosai, C. A. Cockrum, Owen K. Wu, G. S. Kamath, Jeffrey M. Peterson, George R. Chapman, D. M. Jamba
Publikováno v:
Journal of Electronic Materials. 24:423-429
HgCdTe MBE technology is becoming a mature growth technology for flexible manufacturing of short-wave, medium-wave, long-wave, and very long-wave infrared focal plane arrays. The main reason that this technology is getting more mature for device appl
Publikováno v:
Journal of The Electrochemical Society. 141:2888-2893
Autor:
Scott M. Johnson, C. A. Cockrum, R. F. Risser, J. A. Vigil, W. J. Hamilton, W. H. Konkel, T. Tung, J. M. Myrosznyk, J. B. James, W. L. Ahlgren, M. H. Kalisher
Publikováno v:
Journal of Electronic Materials. 22:835-842
Large-area HgCdTe 480×640 thermal-expansion-matched hybrid focal plane arrays were achieved by substituting metalorganic chemical vapor deposition (MOCVD)-grown CdZnTe/GaAs/Si alternative substrate in place of bulk CdZnTe substrates for the growth o
Publikováno v:
Applied Physics Letters. 66:2119-2121
High crystalline quality epitaxial CdTe(112)B/ZnTe films were deposited by molecular‐beam epitaxy directly onto vicinal Si(112) substrates, without use of GaAs interfacial layers. The films were characterized with x‐ray diffraction, optical micro
Publikováno v:
Applied Physics Letters. 63:818-820
Epitaxial structures of ZnTe(100) and CdZnTe(100)/ZnTe(100) have been deposited by molecular‐beam epitaxy onto Si(100) substrates misoriented from 0° to 8° towards the [011] direction. The films were characterized with x‐ray diffraction, photol