Zobrazeno 1 - 10
of 83
pro vyhledávání: '"C T, Nelson"'
Autor:
Q. Li, C. T. Nelson, S.-L. Hsu, A. R. Damodaran, L.-L. Li, A. K. Yadav, M. McCarter, L. W. Martin, R. Ramesh, S. V. Kalinin
Publikováno v:
Nature Communications, Vol 8, Iss 1, Pp 1-8 (2017)
Flexoelectric coupling between strain gradients and polarization influences the physics of ferroelectric devices but it is difficult to directly probe its effects. Here, Li et al. use principal component analysis to compare STEM images with phase-fie
Externí odkaz:
https://doaj.org/article/5c2afb0ab0ce462a92da7d13496d55bb
Autor:
D. Y. Wan, Y. L. Zhao, Y. Cai, T. C. Asmara, Z. Huang, J. Q. Chen, J. Hong, S. M. Yin, C. T. Nelson, M. R. Motapothula, B. X. Yan, D. Xiang, X. Chi, H. Zheng, W. Chen, R. Xu, Ariando, A. Rusydi, A. M. Minor, M. B. H. Breese, M. Sherburne, M. Asta, Q-H Xu, T Venkatesan
Publikováno v:
Nature Communications, Vol 8, Iss 1, Pp 1-9 (2017)
Metallic oxide SrNbO3has been identified as an efficient hydrogen evolution photocatalyst. Here, Venkatesan and co-workers show that its visible light absorption stems from plasmon resonance, thanks to its large carrier density (despite a large 4.1 e
Externí odkaz:
https://doaj.org/article/0a18e1ec0c5142f480ec53a477e8a1e8
Autor:
A K, Yadav, C T, Nelson, S L, Hsu, Z, Hong, J D, Clarkson, C M, Schlepütz, A R, Damodaran, P, Shafer, E, Arenholz, L R, Dedon, D, Chen, A, Vishwanath, A M, Minor, L Q, Chen, J F, Scott, L W, Martin, R, Ramesh
Publikováno v:
Nature. 534(7605)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::fed3fea7626a7054dd260931510d0cd3
https://pubmed.ncbi.nlm.nih.gov/26814971
https://pubmed.ncbi.nlm.nih.gov/26814971
Autor:
Lawrence J. Overzet, Matthew Goeckner, Isabel C. Estrada-Raygoza, C. T. Nelson, Chin-Wook Chung, Gabriel Padron Wells, P. L. Stephan Thamban
Publikováno v:
Plasma Processes and Polymers. 10:119-135
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::78a99ad31dd21186961e231efc0f64d8
https://doi.org/10.1002/ppap.201200066
https://doi.org/10.1002/ppap.201200066
Autor:
Jeremy D Weiss, C. T. Nelson, M D Biegalski, Xiaoqing Pan, Chung Wung Bark, Chiara Tarantini, C. B. Eom, Sanghan Lee, Eric E. Hellstrom, David C. Larbalestier, Yifan Zhang, Anatolii Polyanskii, Jianyi Jiang
Publikováno v:
IEEE Transactions on Applied Superconductivity. 21:2882-2886
In our previous report, we demonstrated the growth of high-quality epitaxial Co-doped Ba(Fe1-xCox)2As2 (Ba-122) thin films using single crystalline SrTiO3 (STO) templates on (La,Sr)(Al,Ta)O3 (LSAT) substrates with pulsed laser deposition (PLD). Here,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c325f40887fd4f8dcecda0c6df9e60eb
https://doi.org/10.1109/tasc.2011.2107722
https://doi.org/10.1109/tasc.2011.2107722
Autor:
Yifan Zhang, W. Tian, Y. Che, X.H. Pan, Wei Guo, D. G. Schlom, Xiaoqing Pan, Z.Z. Ye, B. Liu, C. T. Nelson
Publikováno v:
Chemical Physics Letters. 485:363-366
Zn1−xMgxO thin films are epitaxially grown on (1 1 1) Si substrates using intervening epitaxial Lu2O3 buffer layers by pulsed laser deposition. Lu2O3 buffer layer on Si substrate is essential to the Zn1−xMgxO epitaxial growth. X-ray diffraction,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::443370a0cee66129679689df0ddbe51f
https://doi.org/10.1016/j.cplett.2009.12.046
https://doi.org/10.1016/j.cplett.2009.12.046
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 27:631-642
In a typical plasma tool, both etch and deposition occur simultaneously. Extensive experimental measurements are used to help develop a general model of etch and deposition processes. This model employs reaction probabilities, or surface averaged cro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::12779a5653e5621553baa853b7011160
https://doi.org/10.1116/1.3136850
https://doi.org/10.1116/1.3136850
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 27:193-208
The densities of radicals and neutrals in fluorocarbon (FC) plasmas have been investigated in an inductively coupled plasma system to understand the predominant gain and loss mechanisms of dissociative products and their interaction with chamber surf
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b40610ac078c011a6b8e4b3bf505ad20
https://doi.org/10.1116/1.3065678
https://doi.org/10.1116/1.3065678
Autor:
Ho Won Jang, Chad M. Folkman, Seung Hyub Baek, Yanbin Chen, Xiaoqing Pan, Rasmi R. Das, Ramamoorthy Ramesh, Padraic Shafer, C. T. Nelson, Chang-Beom Eom, Daniel Ortiz
Publikováno v:
Advanced Materials. 21:817-823
Adv. Mater. 2009, 21, 817–823 2009 WILEY-VCH Verlag Gm Multiferroic BiFeO3 has attracted great interest due to its promising application tomagnetoelectric devices. In addition, the high remanent polarization and piezoelectric response of BiFeO3 thi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ce140c440860c744e56d076aab381b74
https://doi.org/10.1002/adma.200800823
https://doi.org/10.1002/adma.200800823
Publikováno v:
Plasma Sources Science and Technology. 16:813-821
This paper examines the complex nature of highly polymerizing fluorocarbon plasmas. An inductively coupled modified GEC reference cell is used to look at process rates on SiO2, p-Si and Si3N4 samples using various chamber geometries and gas chemistri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9e1edd23546f41efbc7eb78f85797c88
https://doi.org/10.1088/0963-0252/16/4/017
https://doi.org/10.1088/0963-0252/16/4/017