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Autor:
C T Lennon, Y Shu, J C Brennan, D K Namburi, V Varghese, D T Hemakumara, L A Longchar, S Srinath, R H Hadfield
Publikováno v:
Materials for Quantum Technology, Vol 3, Iss 4, p 045401 (2023)
Atomic layer deposition (ALD) has been identified as a promising growth method for high-uniformity superconducting thin films for superconducting quantum photonic applications, offering superior uniformity, thickness control and conformality to techn
Externí odkaz:
https://doaj.org/article/13c2804390294a0fbba22f9301225f2a
Publikováno v:
Journal of radiological protection : official journal of the Society for Radiological Protection. 27(1)
This note describes an electronic spreadsheet tool called ReCLAIM v2.0, developed by Nexia Solutions Ltd. The tool calculates doses to exposure groups for assessment of radioactively contaminated land including UK Nuclear Licensed sites on an individ