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pro vyhledávání: '"C M, Rose"'
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Autor:
A R, Kagan, C M, Rose, J M, Bedwinek, P H, Blitzer, D J, Brascho, A P, Brown, L R, Coia, J D, Earle, N A, Janjan, R O, Lowy, R S, Pieters, M, Rotman, S A, Leibel
Publikováno v:
Radiology.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::3e59a7003335c7f2dca6b2f5c3d76e73
https://pubmed.ncbi.nlm.nih.gov/11037533
https://pubmed.ncbi.nlm.nih.gov/11037533
When cone penetrometer testing (CPT) technology is used with in-situ sensors and probes to characterize subsurface conditions in environmental investigations, each sensor must be calibrated with high quality, site specific data to establish essential
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6bb824137f8ca1d12a483bf2986181ef
https://doi.org/10.2172/642676
https://doi.org/10.2172/642676
Publikováno v:
International journal of radiation oncology, biology, physics. 35(4)
In summary, the ASTRO Committee on Human Resources believes that there is ample evidence for the existence of an oversupply of radiation oncologists in the United States at the present time. It believes that this oversupply has already affected the s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::4252266191efdc879ed069600b63f8d7
https://pubmed.ncbi.nlm.nih.gov/8690657
https://pubmed.ncbi.nlm.nih.gov/8690657
Autor:
C M, Rose, J H, Zernik
Publikováno v:
Journal of clinical orthodontics : JCO. 30(2)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::e185213a4b72a742a350c8024350520a
https://pubmed.ncbi.nlm.nih.gov/9063176
https://pubmed.ncbi.nlm.nih.gov/9063176
Publikováno v:
SPIE Proceedings.
The EBES4 electron beam lithography system was designed to optimize overlay and edge placement accuracy. Unique features such as 1/64 micrometer vector scan addressing, figure by figure dose modulation and a high brightness thermal field emission (TF
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::756b5aa6ea04f2c81ca5ccbd0b4c80b8
https://doi.org/10.1117/12.228200
https://doi.org/10.1117/12.228200
Publikováno v:
Photomask and X-Ray Mask Technology.
The i-line stepper is the major manufacturing tool for the exposure of critical levels in the 16 Mb DRAM. There is great advantage to extend the resolution of this technology to the 0.35pmregime in order to use it in the manufacture of 64 Mb DRAMs or
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d85c998c7898d387101636fb9c5c3492
https://doi.org/10.1117/12.191957
https://doi.org/10.1117/12.191957
Publikováno v:
Photomask and X-Ray Mask Technology.
Mask and reticle writing requirements for 256 Mb and 1 Gb DRAM production will place stringent demands on lithography tool capabilities. The Lepton EBES4 mask writer addresses these requirements by utilizing advanced generation e-beam technology whic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::13849d9149c42ab226ef171eba19d2f1
https://doi.org/10.1117/12.191923
https://doi.org/10.1117/12.191923
Autor:
A. R. von Neida, Herbert A. Waggener, Darryl Peters, D. C. Fowlis, C. M. Rose, William P. Wilson
Publikováno v:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III.
Performance specifications, electron gun parameters, selected testing results, and calculated throughput are presented for the second prototype EBES4 which is entering manufacture. The thermal field emitter electron gun is designed for high flux, hig
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ff2f24f573c529275f588a1a38f4c73f
https://doi.org/10.1117/12.146505
https://doi.org/10.1117/12.146505
Autor:
William P. Wilson, A. R. von Neida, D. C. Fowlis, Herbert A. Waggener, Darryl Peters, C. M. Rose
Publikováno v:
SPIE Proceedings.
Performance specifications, electron gun parameters, testing results to date, and throughput are presented for the second prototype EBES4 which is entering manufacture. The thermal field emitter electron gun is designed for high flux, high current st
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::28db5e3888306f87646e698411597393
https://doi.org/10.1117/12.142146
https://doi.org/10.1117/12.142146