Zobrazeno 1 - 10
of 36
pro vyhledávání: '"Byunghoon Yoon"'
Publikováno v:
The Journal of Physical Chemistry C. 116:24784-24791
Highly conducting and transparent hybrid organic–inorganic thin films were grown using atomic layer deposition (ALD) and molecular layer deposition (MLD) techniques. The conducting films were grown at 150 °C by combining ZnO ALD and zincone MLD pr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2d929a2349f82d9858ab83fa6c8375c3
https://doi.org/10.1021/jp3057477
https://doi.org/10.1021/jp3057477
Publikováno v:
Advanced Functional Materials. 23:532-546
Molecular layer deposition (MLD) is a useful technique for fabricating hybrid organic-inorganic thin fi lms. MLD allows for the growth of ultrathin and conformal fi lms using sequential, self-limiting reactions. This article focuses on the MLD of hyb
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::83a653ff96dd4da449d1a8be5a0282c3
https://doi.org/10.1002/adfm.201200370
https://doi.org/10.1002/adfm.201200370
Publikováno v:
The Journal of Physical Chemistry C. 116:3250-3257
Ultrathin and conformal hybrid organic–inorganic thin films can be deposited by molecular layer deposition (MLD) techniques. By combining the hybrid organic–inorganic MLD process with an inorganic ...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::073d8278e28db68cd3694142b302bb2a
https://doi.org/10.1021/jp209003h
https://doi.org/10.1021/jp209003h
Autor:
Byoung H. Lee, A. I. Abdulagatov, Steven M. George, Robert A. Hall, Zachary M. Gibbs, Byunghoon Yoon, Dragos Seghete, Younghee Lee
Publikováno v:
Atomic Layer Deposition of Nanostructured Materials
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e28451ee7524fd9febc9713095ece3fd
https://doi.org/10.1002/9783527639915.ch5
https://doi.org/10.1002/9783527639915.ch5
Publikováno v:
ECS Transactions. 41:271-277
Hybrid organic-inorganic thin film alloys were fabricated by molecular layer deposition (MLD) and atomic layer deposition (ALD) methods using diethyl zinc (DEZ), hydroquinone (HQ), and water (H2O). Sequential exposures of DEZ & HQ for zincone MLD and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::77f3d1f24373b91c640dafe44af0cfe8
https://doi.org/10.1149/1.3633677
https://doi.org/10.1149/1.3633677
Publikováno v:
Journal of Nanoscience and Nanotechnology. 11:7948-7955
Hybrid organic-inorganic films can be deposited using atomic layer deposition (ALD) and molecular layer deposition (MLD) techniques. A special set of hybrid organic-inorganic films based on metal precursors and various organic alcohols yields metal a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c63bcb97737c16e7cf2393aa604d42a4
https://doi.org/10.1166/jnn.2011.5034
https://doi.org/10.1166/jnn.2011.5034
Publikováno v:
ECS Transactions. 33:191-195
Conductive hybrid organic-inorganic thin films were fabricated by molecular layer deposition (MLD) methods using diethyl zinc (DEZ) and hydroquinone (HQ). Sequential exposures of DEZ and HQ led to linear MLD film growth. The mass gains measured by qu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::67bf4dd561ca1634578f9183134e9792
https://doi.org/10.1149/1.3565514
https://doi.org/10.1149/1.3565514
Publikováno v:
Langmuir. 26:19045-19051
Hybrid organic-inorganic films were grown by molecular layer deposition (MLD) with a three-step ABC reaction sequence using (A) trimethylaluminum (TMA), (B) ethanolamine (EA), and (C) maleic anhydride (MA) at 90 °C. Very large steady state mass gain
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7ccd919e3b529c5aaf8bb9788527b23d
https://doi.org/10.1021/la102649x
https://doi.org/10.1021/la102649x
Publikováno v:
ECS Transactions. 33:223-229
Atomic layer deposition (ALD) was utilized to grow LiOH and Li2CO3 films using lithium tert-butoxide, H2O and CO2. Film growth was monitored with a quartz crystal microbalance at 225 °C. LiOH ALD had a growth rate of 12.7 ng•cm-2•cycle-1 before
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b3bc5fbe68e64243cb300ec9176458b5
https://doi.org/10.1149/1.3485259
https://doi.org/10.1149/1.3485259
Publikováno v:
Chemistry of Materials. 21:5365-5374
Thin film growth using molecular layer deposition (MLD) or atomic layer deposition (ALD) is based on sequential, self-limiting surface reactions. In this work, MLD is used to grow a hybrid organic−inorganic polymer film based on a three-step ABC re
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::667d259fea1ca4300d02e6b1bb2e6212
https://doi.org/10.1021/cm9013267
https://doi.org/10.1021/cm9013267