Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Byung-Moo Kim"'
Autor:
Piyush Pathak, Jin Kim, Junsu Jeon, Jaehwan Kim, Byung-Moo Kim, Ya-Chieh Lai, Jae-Hyun Kang, Sangah Lee, Frank E. Gennari, Philippe Hurat, Shin Byung-Chul, Seung Weon Paek
Publikováno v:
Design-Process-Technology Co-optimization for Manufacturability XIII.
Continuous scaling of CMOS process technology to 7nm (and below) has introduced new constraints and challenges in determining Design-for-Yield (DFY) solutions. In this work, traditional solutions such as improvements in redundancy and in compensating
Publikováno v:
Journal of the Chungcheong Mathematical Society. 25:763-769
In this paper, we define the strong -integral of Banach-valued functions and investigate some properties of the strong -integral.
Publikováno v:
Journal of the Chungcheong Mathematical Society. 25:349-357
In this paper we introduce the C-delta integral which generalize the McShane delta integral and investigate some properties of these integrals.
Publikováno v:
Journal of the Chungcheong Mathematical Society. 25:115-125
In this paper, we define the -integral of Banach-valued functions and investigate some properties of the -integral.
Publikováno v:
ECS Transactions. 22:305-316
We present some of our first experiments on the controlled growth of silicon nanowires and carbon nanotubes in lateral porous alumina templates synthesized by anodic oxidation of Al thin films. Under adapted chemical vapor deposition growth condition
Publikováno v:
Communications of the Korean Mathematical Society. 20:291-297
In this paper, we introduce the SP-integral and the SPfi-integral deflned on an interval in the n-dimensional Euclidean space R n . We also investigate the relationship between these two integrals. It is well known (3) that the Perron integral deflne
Publikováno v:
Bulletin of the Korean Mathematical Society. 40:77-83
In this paper, we study the strong Perron integral, and show that the strong Perron integral is equivalent to the McShane integral.
Autor:
Evan Lee, Jean-Marie Brunet, Wael ElManhawy, Hung bok Choi, Jae-Hyun Kang, Kareem Madkour, Joe Kwan, Naya Ha, Byung-Moo Kim, Sarah Mohamed, Kee Sup Kim
Publikováno v:
SPIE Proceedings.
As technology nodes scale beyond 20nm node, design complexity increases and printability issues become more critical and hard for RET techniques to fix. It is now mandatory for designers to run lithography checks prior to tape out and acceptance by t
Autor:
Hungbok Choi, Shady Abdelwahed, Ahmed Mohy, Mohamed Imam, Seung Weon Paek, Naya Ha, Byung-Moo Kim, Joo-Hyun Park, Kee Sup Kim, Jae-Hyun Kang
Publikováno v:
Design for Manufacturability through Design-Process Integration VI.
As a result, low fidelity patterns due to process variations can be detected and eventually corrected by designers as early in the tape out flow as right after design rule checking (DRC); a step no longer capable to totally account for process constr
Autor:
KangDuck Lee, Daehyun Jang, Joong-Won Jeon, Woon-Hyuk Choi, Joo-Hyun Park, No-Young Chung, Ki-Su Kim, Kun Young Chung, Seung Weon Paek, Bong-Seok Kim, DongSup Song, Byung-Moo Kim, WooYoung Noh, Sang-Min Bae, HyunSeok Song, Kee Sup Kim, Dae-Wook Kim, Jae Hyun Kang, Hungbok Choi, Seong-Ho Park, Junsu Jeon, Kyu-Myung Choi, Young-Duck Kim, Sung-eun Yu, Jinwoo Lee, Naya Ha, Young-ki Hong
Publikováno v:
Design for Manufacturability through Design-Process Integration VI.
A set of design for manufacturing (DFM) techniques have been developed and applied to 45nm, 32nm and 28nm logic process technologies. A noble technology combined a number of potential confliction of DFM techniques into a comprehensive solution. These