Zobrazeno 1 - 10
of 78
pro vyhledávání: '"Byung Jun, Lee"'
Autor:
Byung-Jun Lee
Publikováno v:
The Justice. 194:97-124
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ec4060c3981a08bcbee1749c2d59c01f
https://doi.org/10.29305/tj.2023.2.194.97
https://doi.org/10.29305/tj.2023.2.194.97
Publikováno v:
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f0f658e18bf3f88782ab4c63c2067f15
https://doi.org/10.1109/asmc57536.2023.10121099
https://doi.org/10.1109/asmc57536.2023.10121099
Publikováno v:
Materials, Vol 14, Iss 6, p 1432 (2021)
This work summarizes the results of our previous studies related to investigations of reactive ion etching kinetics and mechanisms for widely used silicon-based materials (SiC, SiO2, and SixNy) as well as for the silicon itself in multi-component flu
Externí odkaz:
https://doaj.org/article/3bb668b8b77e49b6ba9d47d8d2487458
Publikováno v:
Materials, Vol 13, Iss 23, p 5476 (2020)
In this work, we carried out the study of CF4 + O2 + X (X = C4F8 or CF2Br2) gas chemistries in respect to the SiOxNy reactive-ion etching process in a low power regime. The interest in the liquid CF2Br2 as an additive component is motivated by its ge
Externí odkaz:
https://doaj.org/article/b00c2bd12cec46118747d534f1820e17
Publikováno v:
Journal of Nanoscience and Nanotechnology. 21:5157-5164
Silicon oxycarbide (SiOC) film was etched using a CF4/C6F12O/O2 mixed gas plasma through an inductively coupled plasma etcher. Changes in the dielectric constant and surface chemical bonding properties were investigated using ellipsometry and Fourier
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::52b35f0b622479aed4500057c7976b76
https://doi.org/10.1166/jnn.2021.19337
https://doi.org/10.1166/jnn.2021.19337
Publikováno v:
New & Renewable Energy. 17:16-23
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e98088af9d8435e67e0a7f51a0fbc940
https://doi.org/10.7849/ksnre.2021.0012
https://doi.org/10.7849/ksnre.2021.0012
Publikováno v:
Plasma Chemistry and Plasma Processing. 40:1365-1380
In this work, we investigated the possibidlxlity to control both gas-phase chemistry and silicon etching kinetics in C4F8 + O2 + Ar inductively coupled plasma by changes in O2/Ar, C4F8/O2 and C4F8/Ar mixing ratios at the constant fraction of the rest
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9d9dc5fe7e82b8bbf59808af76e06eb3
https://doi.org/10.1007/s11090-020-10097-9
https://doi.org/10.1007/s11090-020-10097-9
Publikováno v:
Science of Advanced Materials. 12:628-640
The influences of both HBr/O2 (at constant Cl2 fraction) and Cl2/O2 (at constant HBr fraction) ratios in HBr + Cl 2 + O2 gas mixture on bulk plasma characteristics, active species densities and etching kinetics of silicon were studied. The results in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::61e91cfe62edabebdb956014c6656c1d
https://doi.org/10.1166/sam.2020.3676
https://doi.org/10.1166/sam.2020.3676
Publikováno v:
Korean Journal of Anesthesiology, Vol 58, Iss 3, Pp 311-317 (2010)
Herpes zoster is the consequence of reactivation of latent varicella zoster virus from dorsal root ganglia. Postherpetic neuralgia (PHN) may be diagnosed when pain persists in a dermatomal pattern long after the vesicular erruption has healed. PHN is
Externí odkaz:
https://doaj.org/article/3a485ca7344245408cf8a055e6cc1166
Publikováno v:
Korean Society For The Study Of Physical Education. 23:113-129
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::63139e7f1abadc4c61a3fd8afb59cab2
https://doi.org/10.15831/jksspe.2019.23.4.113
https://doi.org/10.15831/jksspe.2019.23.4.113