Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Byoung-Kwon Choo"'
Autor:
Gi-Ppeum Jeong, Jun-Seong Park, Seung-Jae Lee, Pil-su Kim, Man-Hyup Han, Seong-Wan Hong, Eun-Seong Kim, Jin-Hyung Park, Byoung-Kwon Choo, Seung-Bae Kang, Jea-Gun Park
Publikováno v:
Scientific Reports, Vol 12, Iss 1, Pp 1-10 (2022)
Abstract In this study, the chemical decomposition of a polyimide-film (i.e., a PI-film)-surface into a soft-film-surface containing negatively charged pyromellitic dianhydride (PMDA) and neutral 4,4′-oxydianiline (ODA) was successfully performed.
Externí odkaz:
https://doaj.org/article/b2d88fea839a4b08bae5c4aedf494f14
Autor:
Seunghyun Jang, Byoungtaek Son, Myungbo Sim, Kihwan Kim, Yongsoo Lee, Tae Young Choi, Yongsu Lee, Byoung Kwon Choo, Seungin Baek, Yongjo Kim
Publikováno v:
SID Symposium Digest of Technical Papers. 53:151-154
Publikováno v:
Journal of the Korean Physical Society. 79:44-48
In this study, a novel chemical–mechanical planarization (CMP) slurry that can perform self-stop polishing was designed. The essential aspects for self-stop polishing are precise design of a nonionic polymer type, molecular weight, and molecular co
Autor:
Gi-Ppeum Jeong, Jun-Seong Park, Seung-Jae Lee, Pil-su Kim, Man-Hyup Han, Seong-Wan Hong, Eun-Seong Kim, Jin-Hyung Park, Byoung-Kwon Choo, Seung-Bae Kang, Jea-Gun Park
Publikováno v:
Scientific reports. 12(1)
In this study, the chemical decomposition of a polyimide-film (i.e., a PI-film)-surface into a soft-film-surface containing negatively charged pyromellitic dianhydride (PMDA) and neutral 4,4′-oxydianiline (ODA) was successfully performed. The chemi
Publikováno v:
Journal of Non-Crystalline Solids. 354:2879-2884
We studied a direct ink stamp (IS) process as a next generation patterning method using polydimethylsiloxane (PDMS) soft stamp and low viscosity ink resist. A propylene glycol monomethyl ether acetate (PGMEA) diluted novolak resist was used as an ink
Publikováno v:
Journal of Non-Crystalline Solids. 352:1704-1707
We studied ultraviolet micro imprint lithography (UV-MIL) for the manufacture of amorphous silicon (a-Si) thin-film transistors (TFTs) using a master mold. A teflon amorphous fluoropolymer produced by rotary vacuum evaporation was used to detach the
Publikováno v:
Thin Solid Films. 427:289-293
We studied the growth of super-grain polycrystalline silicon by silicide mediated crystallization of amorphous silicon (a-Si) using a pulsed rapid thermal annealing (RTA). The Ni particles of 4.6×1012 cm−2 were scattered onto the a-Si and then hea
Publikováno v:
IEEE Electron Device Letters. 24:78-80
A triode rectifier switching (TRS) device composed of two amorphous silicon (a-Si) diodes and one resistor has been demonstrated experimentally to be a good switching device for active-matrix liquid-crystal display (AMLCD). The output and transfer ch
Autor:
Byoung Kwon Choo, Jae Beom Choi, Won-Kyu Lee, Hye-Dong Kim, Young Jin Chang, In-Do Chung, Seong Hyun Jin, Yong Soo Lee, Sang-soo Kim, Kwon-Hyung Lee, Cheol Ho Park, Jae Hwan Oh, Hyun Bin Hwang
Publikováno v:
SID Symposium Digest of Technical Papers. 41:794
An excimer-laser-based two-shot sequential lateral solidification (TS-SLS) process has been developed to fabricate 30” FHD (1920×RGB×1080) AMOLED TVs using both 2D projection and line-scan SLS systems. We have optimized (1) the microstructure of
Publikováno v:
Journal of The Electrochemical Society. 155:J157
We studied the formation of a resist pattern by a zero residual layer process with microimprint lithography (MIL) using a soft mold. Polyethylene glycol-dimethacrylate as an UV hardening-type resist and polydimethylsiloxane as a soft mold were used f