Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Byeong Seong Cho"'
Publikováno v:
Vacuum. 148:33-40
We used an inline system equipped with a linear plasma enhanced chemical vapor deposition (L-PECVD) source available at low temperatures for the thin film encapsulation of flexible organic light emitting diode displays. This inline system can be used
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::39ab0eb682628f514b1e41be8dcf3f2f
https://doi.org/10.1016/j.vacuum.2017.10.036
https://doi.org/10.1016/j.vacuum.2017.10.036
Autor:
Eun Ha Choi, Seung Oun Kang, Hyun Joo Oh, Changjo Kim, Han S. Uhm, Yoon S. Choi, Byeong Seong Cho
Publikováno v:
Current Applied Physics. 11:S172-S176
The liquid metal ion sources (LMIS) in focused ion beam (FIB) system have many advantages of high current density, high brightness and low ion energy spread. There are two electrodes being emitter and extractor for field ion emission in LMIS. But sev
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::28860316acd7698ea97ff6540d7148a2
https://doi.org/10.1016/j.cap.2011.03.069
https://doi.org/10.1016/j.cap.2011.03.069
Publikováno v:
Journal of Information Display. 11:149-153
To improve the luminescence characteristics of high‐efficiency alternating‐current plasma display panels (AC‐PDPs), we developed a new hoof‐type electrode structure, and we studied the spatiotemporal behavior of the density of the excited Xen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e13b32a4d08a334d99ced2230d4ded45
https://doi.org/10.1080/15980316.2010.9665843
https://doi.org/10.1080/15980316.2010.9665843
Publikováno v:
2010 Abstracts IEEE International Conference on Plasma Science.
The liquid metal ion sources (LMIS) in FIB system have many advantages of high current density, high brightness and low ion energy spread. Most FIB systems use LMIS because the ion beam spot size of LMIS is smaller than of gas field ionization source
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c37d3a0928d123138316173d1290ab08
https://doi.org/10.1109/plasma.2010.5534232
https://doi.org/10.1109/plasma.2010.5534232
Publikováno v:
2010 Abstracts IEEE International Conference on Plasma Science; 2010, p1-1, 1p