Zobrazeno 1 - 2
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pro vyhledávání: '"Burkhard Ludwig"'
Autor:
Rainer Pforr, Burkhard Ludwig, Mario Hennig, Nicolo Morgana, Marco Ahrens, Wolfgang Dettmann, Roderick Koehle, Joerg Thiele
Publikováno v:
SPIE Proceedings.
The lithographic potential of alternating PSM for sub-100nm gate patterning have been evaluated in comparison to alternative techniques. The status of the key elements of the full level alternating PSM approach including design conversion, optical pr
Autor:
Rainer Pforr, Molela Moukara, Marco Ahrens, Joerg Thiele, Mario Hennig, Michael Heissmeier, Wolfgang Dettmann, Burkhard Ludwig
Publikováno v:
SPIE Proceedings.
A study to partition a gate level design into an alternating phase shift mask and a chrome on glass trim mask is presented. After determination of important rules for the partitioning by simulation, all investigated gate level pattern could be partit