Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Burcin Erenturk"'
Publikováno v:
Microelectronic Engineering. 98:89-96
Graphical abstractDisplay Omitted Highlights? We report a powerful new route to fabricate air gap dielectrics with well-defined pore geometries. ? Method utilizes the combination of nanoimprint lithography and a sacrificial template approach. ? Succe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8b02e04ce675ae9496cc62c44e771a74
https://doi.org/10.1016/j.mee.2012.03.006
https://doi.org/10.1016/j.mee.2012.03.006
Autor:
Sarah-Ann M. Claiborne, Kenneth R. Carter, Dhandapani Venkataraman, Serkan Gürbüz, Jason W. Krizan, Burcin Erenturk, Rachel E. Corbett
Publikováno v:
Chemistry of Materials. 23:3371-3376
Highly crystalline, continuous parallel arrays of CdSe nanowires have been generated through electrodeposition using photoresist templates. Easy soft imprint nanolithography (ESINL) was used to pattern a commercially available photoresist, Norland Op
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::144111504e779a489089abcff84de636
https://doi.org/10.1021/cm201384p
https://doi.org/10.1021/cm201384p
Autor:
David Cho, Paramjit Singh, Singh Sunil K, Craig Higgins, Sohan Singh Mehta, Chia Ann, Lakshmi K. Ganta, Lokesh Subramany, Ravi Prakash Srivastava, Hui Peng Koh, Burcin Erenturk, Vikrant Chauhan, Yixu Wu
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
Immersion based 20nm technology node and below becoming very challenging to chip designers, process and integration due to multiple patterning to integrate one design layer . Negative tone development (NTD) processes have been well accepted by indust
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::03b6172ec4afa2ef24c2a6d1af08f9f5
https://doi.org/10.1117/12.2087546
https://doi.org/10.1117/12.2087546
Autor:
Hayriye Ozhalici, Iskender Yilgor, Burcin Erenturk, Garth L. Wilkes, Emel Yilgor, Jignesh P. Sheth
Publikováno v:
Polymer. 46:8185-8193
Poly(propylene oxide) (PPO) was incorporated in a controlled manner between poly(dimethylsiloxane) (PDMS) and urea segments in segmented polyurea copolymers and their solid state structure–property behavior was investigated. The copolymers containe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c2bc12079f263042f1fea0e2c2a8e128
https://doi.org/10.1016/j.polymer.2005.06.050
https://doi.org/10.1016/j.polymer.2005.06.050
Autor:
Alexander Wei, Huikan Liu, Bassem Hamieh, Gregory McIntyre, Alvin G. Thomas, Burcin Erenturk, Ayman Hamouda, David Moreau, Wei Guo, Jason E. Meiring, Hyun Chol Choi
Publikováno v:
SPIE Proceedings.
Printing small vias with tight pitches is becoming very challenging and consequently, different techniques are explored to achieve a robust and stable process. These techniques include reverse tone imaging (RTI) process, source optimization, mask tra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::afaad63f094ef94492c3d002f902ffc3
https://doi.org/10.1117/12.2011349
https://doi.org/10.1117/12.2011349
Autor:
Burcin Erenturk, Serkan Gurbuz, Rachel E. Corbett, Sarah-Ann M. Claiborne, Jason Krizan, Dhandapani Venkataraman, Kenneth R. Carter
Publikováno v:
Chemistry of Materials; Jul2011, Vol. 23 Issue 14, p3371-3376, 6p