Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Bumjin Choi"'
Autor:
Bumjin Choi, Jinyoung Kang, Yong-Hyeon Kim, Kyusun Lee, Hyoungsun Hong, Gyo-Young Jin, Aeran Hong, Kweonjae Lee, Joosung Lee, Jinman Chang, Tae-Heon Kim, Hyoung Jun Kim, Daehan Han
Publikováno v:
SPIE Proceedings.
In a sub 2Xnm node process, the feedback of pattern weak points is more and more significant. Therefore, it is very important to extract the systemic defect in Double Patterning Technology(DPT), however, it is impossible to predict exact systemic def
Autor:
Tae-Heon Kim, Yong-Hyeon Kim, Hyeongsun Hong, Joo-young Lee, Jinman Chang, Kyu-Pil Lee, Daehan Han, Jinyoung Kang, Aeran Hong, Bumjin Choi, Gyo-Young Jin, Kyusun Lee, Kweonjae Lee, Joosung Lee
Publikováno v:
SPIE Proceedings.
It is increasingly difficult to determine degree of completion of the patterning and the distribution at the DRAM Cell Patterns. When we research DRAM Device Cell Pattern, there are three big problems currently, it is as follows. First, due to etch l
Autor:
Jinman Chang, Kyu-Pil Lee, Tae-Heon Kim, Hyeongsun Hong, Kye-hee Yeom, Kyusun Lee, Aeran Hong, Yong-Hyeon Kim, Kweonjae Lee, Joosung Lee, Jinyoung Kang, Joo-young Lee, Bumjin Choi, Gyo-Young Jin, Daehan Han
Publikováno v:
SPIE Proceedings.
Starting with the sub 2Xnm node, the process window becomes smaller and tighter than before. Pattern related error budget is required for accurate critical-dimension control of Cell layers. Therefore, lithography has been faced with its various diffi