Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Bujamin Misimi"'
Autor:
Isabell Geisler, Michael Forster, Bujamin Misimi, Jakob Schedlbauer, Thomas Riedl, John M. Lupton, Ullrich Scherf
Publikováno v:
Organic Materials, Vol 03, Iss 02, Pp 184-190 (2021)
Abstract A fully soluble poly(9,10-anthrylene ethynylene), poly[2,6-(2-octyldecyl)-9,10-anthrylene ethynylene] PAAE, with moderate degrees of polymerization Pn of ca. 10 is generated in a reductive, dehalogenative homocoupling scheme, starting from
Externí odkaz:
https://doaj.org/article/3a7752b9e4a248f08b4499955d98eb6a
Autor:
Michael Forster, Ullrich Scherf, Thomas Riedl, John M. Lupton, Isabell S. Geisler, Bujamin Misimi, Jakob Schedlbauer
Publikováno v:
Organic Materials, Vol 03, Iss 02, Pp 184-190 (2021)
A fully soluble poly(9,10-anthrylene ethynylene), poly[2,6-(2-octyldecyl)-9,10-anthrylene ethynylene] PAAE, with moderate degrees of polymerization Pn of ca. 10 is generated in a reductive, dehalogenative homocoupling scheme, starting from a 2,6-dial
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0f4c45a5eaf74f4320860177082cb353
https://doi.org/10.1055/a-1472-6806
https://doi.org/10.1055/a-1472-6806
Autor:
Arbresha Muriqi, Bujamin Misimi, Anjana Devi, Thomas Riedl, Detlef Theirich, Detlef Rogalla, Tim Hasselmann, Nils Boysen, Michael Nolan, Tobias Haeger, Jan-Lucas Wree
This paper demonstrates a carbene stabilized precursor [Cu(tBuNHC)(hmds)] with suitable volatility, reactivity and thermal stability, that enables the spatial plasma-enhanced atomic layer deposition (APP-ALD) of copper thin films at atmospheric press
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a7202aab376a5551729595b7ce8fa369
https://hdl.handle.net/10468/10759
https://hdl.handle.net/10468/10759
Autor:
Tim Hasselmann, Bujamin Misimi, Nils Boysen, David Zanders, Jan‐Lucas Wree, Detlef Rogalla, Tobias Haeger, Florian Zimmermann, Kai Oliver Brinkmann, Sebastian Schädler, Detlef Theirich, Ralf Heiderhoff, Anjana Devi, Thomas Riedl
Publikováno v:
Advanced Materials Technologies. 8(1):2200796
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::84692a725a4118da02796f2f2c3e4326
Autor:
Hasselmann, Tim, Misimi, Bujamin, Boysen, Nils, Zanders, David, Wree, Jan‐Lucas, Rogalla, Detlef, Haeger, Tobias, Zimmermann, Florian, Brinkmann, Kai Oliver, Schädler, Sebastian, Theirich, Detlef, Heiderhoff, Ralf, Devi, Anjana, Riedl, Thomas
Publikováno v:
Advanced Materials Technologies; Jan2023, Vol. 8 Issue 1, p1-9, 9p
Publikováno v:
Chemical Communications; 11/18/2020, Vol. 56 Issue 89, p13669-13680, 12p
Autor:
Boysen, Nils, Misimi, Bujamin, Muriqi, Arbresha, Wree, Jan-Lucas, Hasselmann, Tim, Rogalla, Detlef, Haeger, Tobias, Theirich, Detlef, Nolan, Michael, Riedl, Thomas, Devi, Anjana
Publikováno v:
Chemical Communications; 11/18/2020, Vol. 56 Issue 89, p13752-13755, 4p