Innovative remote plasma source for atomic layer deposition for GaN devices.

Autor: Knoops, Harm C. M., Arts, Karsten, Buiter, Jan W., Martini, Luca Matteo, Engeln, Richard, Hemakumara, Dilini Tania, Powell, Michael, Kessels, Wilhelmus M. M., Hodson, Chris J., O'Mahony, Aileen

Publikováno v: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Nov2021, Vol. 39 Issue 6, p1-9, 9p