Zobrazeno 1 - 10
of 22
pro vyhledávání: '"Bugeun Ki"'
Publikováno v:
ACS Omega, Vol 2, Iss 5, Pp 2100-2105 (2017)
Externí odkaz:
https://doaj.org/article/dcd889c6306a4202a8305a42c435cf72
Publikováno v:
Nanoscale. 12:6411-6419
Direct machining and imprinting of Si are beneficial for simplifying the fabrication of microelectromechanical systems, nanoelectromechanical systems, optical devices, and fin field-effect transistors, and for reducing process costs. Electrochemical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2ad3dad51f347b62fa49e323e2d6c680
https://doi.org/10.1039/c9nr10420h
https://doi.org/10.1039/c9nr10420h
Publikováno v:
ACS Nano. 13:13465-13473
Anodic imprint lithography patterns the GaAs substrate electrochemically by applying a voltage through a predefined anodic stamp. This newly devised technique performs anodic etching in a stamping manner. Stamps that serve as anodic electrodes are fa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::319aa7c8c4a8ba5ed3f12ba16ec3b199
https://doi.org/10.1021/acsnano.9b07072
https://doi.org/10.1021/acsnano.9b07072
Publikováno v:
Scientific Reports, Vol 10, Iss 1, Pp 1-9 (2020)
Scientific Reports
Scientific Reports
This study introduces a new chemical carving technique as an alternative to existing lithography and etching techniques. Chemical carving incorporates the concept of scanning probe lithography and metal-assisted chemical etching (MaCE). A catalyst-co
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::73d16eb52f3e3aa963c74f1aea736813
https://doi.org/10.1038/s41598-020-70407-1
https://doi.org/10.1038/s41598-020-70407-1
Publikováno v:
ACS Applied Energy Materials. 1:4804-4813
To improve overall electrochemical performance, we report and propose zinc cobaltite (ZnCo2O4) nanowire arrays with a simple and precisely controllable NH3 plasma treatment. The NH3 plasma treatmen...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::83403e798f8c912202bfa3d615aee5e3
https://doi.org/10.1021/acsaem.8b00892
https://doi.org/10.1021/acsaem.8b00892
Publikováno v:
ACS Nano. 12:609-616
Conventional lithography using photons and electrons continues to evolve to scale down three-dimensional nanoscale patterns, but the complexity of technology and equipment is increasing due to diffraction and scattering problems. Physical contact lit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d21742bd5ede9ffe5b5bef5d38a494d6
https://doi.org/10.1021/acsnano.7b07480
https://doi.org/10.1021/acsnano.7b07480
Publikováno v:
Applied Surface Science. 567:150806
In recent times, triboelectric nanogenerators (TENGs) have been extensively studied as green sources for harvesting energy. Paradoxically, TENGs are mostly based on nondegradable synthetic plastics, which are the main source of marine pollution. Here
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::41f45d9eb50c06b3c083c165c6b986b5
https://doi.org/10.1016/j.apsusc.2021.150806
https://doi.org/10.1016/j.apsusc.2021.150806
Autor:
Jong Hoi Cho, Min-Ho Jang, Yang-Seok Yoo, Seung Hyuk Lim, Hyun Gyu Song, Chulwon Lee, Jungwoo Oh, Yong-Hoon Cho, Bugeun Ki
Publikováno v:
Scientific Reports
Scientific Reports, Vol 9, Iss 1, Pp 1-9 (2019)
Scientific Reports, Vol 9, Iss 1, Pp 1-9 (2019)
The influence of thermal annealing on the properties of germanium grown on silicon (Ge-on-Si) has been investigated. Depth dependencies of strain and photoluminescence (PL) were compared for as-grown and annealed Ge-on-Si samples to investigate how i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::716c88bd9be32b8e0d47bcc77180402f
https://doi.org/10.1038/s41598-019-48032-4
https://doi.org/10.1038/s41598-019-48032-4
Publikováno v:
ACS applied materialsinterfaces. 11(14)
We introduce a method for the direct imprinting of GaAs substrates using wet-chemical stamping. The predefined patterns on the stamps etch the GaAs substrates via metal-assisted chemical etching. This is a resist-free method in which the stamp and th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0ce6ab6e587b16b59fcd16a10987e206
https://pubmed.ncbi.nlm.nih.gov/30784266
https://pubmed.ncbi.nlm.nih.gov/30784266
Publikováno v:
Solar Energy. 135:291-296
Antireflective Si subwavelength structures (SWSs) are fabricated after the texturing of nano-scale holes directly onto micro-scale inverted pyramid arrays. Thermally agglomerated Au catalysts and Au-assisted chemical etching adjusted the featured nan
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f276c757cd96ba1bb2d79529b7bf2238
https://doi.org/10.1016/j.solener.2016.06.009
https://doi.org/10.1016/j.solener.2016.06.009