Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Bryan Rhoads"'
Autor:
Javier Ayala, Michael Carbonell, Bryan Rhoads, Aurelia Suwarno-Handayana, Anne Friedman, Raymond Van Roijen, Oh-Jung Kwon
Publikováno v:
2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
We provide two examples of defects that caused real yield degradation on wafers, where the defects were not created during processing of the wafers. One is a case of a common non-process step unexpectedly causing a defect. The second is related to qu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::171aa8b0ab1c5c6c6784525876642a61
https://doi.org/10.1109/asmc.2019.8791773
https://doi.org/10.1109/asmc.2019.8791773
Autor:
Cathy Gow, Edward Crawford, Yongchun Xin, Kan Zhang, Jang Sim, Fan Zheng, Dave Salvador, Rebekah Sheraw, Ben Stahl, Bryan Rhoads, Ishtiaq Ahsan, Brett Engel, Amanda L. Tessier, Xiao Pan, Brad Austin, Lori Kermel, William Davies
Publikováno v:
2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
In the state of the art development of chip manufacturing (FinFet technology for example) both optical inspection and inline electrical test are deployed to monitor and facilitate the process development. While optical inspection provides critical pr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5b735df40ec4c5974d6c4b406d8f530a
https://doi.org/10.1109/asmc.2016.7491094
https://doi.org/10.1109/asmc.2016.7491094
Publikováno v:
Microscopy and Microanalysis. 22:280-281
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2f169afcb10a1513b49cb8a43a4cca7d
https://doi.org/10.1017/s1431927616002257
https://doi.org/10.1017/s1431927616002257
Publikováno v:
CHI Extended Abstracts
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9e12735540992eb8c458b910afa1a593
https://doi.org/10.1145/1056808.1057125
https://doi.org/10.1145/1056808.1057125