Zobrazeno 1 - 10 of 76 pro vyhledávání: '"Brutscher, J"'
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Akademický článek
Generation of high voltage pulses for PBII devices
Autor: Günzel, R *, Rogozin, A.I, Demski, M, Rukin, S.N, Brutscher, J, Th. H.G.G, Weise
Publikováno v: In Surface & Coatings Technology 2002 156(1):54-60
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3
Verfahren zur Implantation von Ionen in leitende bzw. halbleitende Werkstücke mittels PIII und Implantationskammer zur Durchführung des Verfahrens
Autor: Brutscher, J., Günzel, R.
Publikováno v: EP 0 786 792 A1
Deutsche Patentanmeldung DE 195 38 903 A1
Der Erfindung betrifft ein Verfahren zur Implantation von Ionen gasförmiger Elemente in leitende bzw. halbleitende Werkstücke mittels Plasmaimmersionsimplantation ( PIII ) das ohne aufwendige Hochspannungspulser zu guten Implantationsergebnissen f
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::802f25a7cde4322896428ef049956625
https://www.hzdr.de/publications/Publ-3274-2
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4
Measured and Calculated Dose Distribution for 3-D Plasma Immersion Ion Implantation
Autor: Mändl, S., Reuther, H., Brutscher, J., Günzel, R., Möller, W.
Publikováno v: Surface & Coatings Technology 93 (1997) 229-233
3rd International Workshop on Plasma-Based Ion Implantation (PBII), Dresden, Germany, Sept. 16-18, 1996
Nitrogen was implanted into four cylinders (height 37 mm and diameter 4, 6, 8, and 12 mm) covered with aluminium foil using plasma immersion ion implantation at 30 kV. The homogeneity of the implantation, i.e. the spatial variation of the implanted d
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::db41216400ed659c338210ab2d744c72
https://www.hzdr.de/publications/Publ-694-1
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6
Plasma immersion implantation using pulsed plasma with DC and pulsed high voltages
Autor: Brutscher, J., Günzel, R., Möller, W.
Publikováno v: Surf. Coati. Technol. 93 (1997) 197
3rd International Workshop on Plasma-Based Ion Implantation (PBII), Dresden, Germany, Sept. 16-18, 1996
New experiments in plasma immersion ion implantation (PIII) have been performed to explore the extended operation regimes available with pulsed plasmas. A pulsed extraction voltage and a synchronized pulsed plasma show a further reduction of thermal
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::c29b7131562ea76352b83962e3fb5f06
https://www.hzdr.de/publications/Publ-702-2
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7
The use of plasma source ion implantation for wear protection
Autor: Günzel, R., Brutscher, J., Mändl, S., Möller, W.
Publikováno v: Y. Pauleau and P. B. Barna (eds), Protective Coatings and Thin Films, pp. 635-647, c 1997 Kluwer Academic Publishers, Printed in the Netherlands
Protective Coatings and Thin Films ISBN: 9789401063807
NATO-ARW, Portimao, Portugal, 30.5.-5.6.1996
Plasma source ion implantation (PSII) has been developed as an alternative technique to circumvent the limitations of conventional ion implantation, like the requirements of a complicated target handling and beam raster system for a uniform ion impla
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::435b39fdc8cfd1cd94f144f50359b2e4
https://www.hzdr.de/publications/Publ-547-2
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10
A 100 kV 10 A high-voltage pulse generator for plasma immersion ion implantation
Autor: Brutscher, J.
Publikováno v: Review of Scientific Instruments 67 (1996) 7 pp. 2621-2625
The design of a high voltage pulsing system for a plasma immersion ion implantation (PIII) facility is presented. A list of requirements, which have to be fulfilled by a high voltage pulse generator to get best results and a optimum operation of the
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od______4577::13e4d780c68823666b2ce34aac9bb18d
https://www.hzdr.de/publications/Publ-490-1
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